Semiconductor cleaner systems and methods

US9401270B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9401270-B2
Application numberUS-201514682059-A
CountryUS
Kind codeB2
Filing dateApr 8, 2015
Priority dateJun 23, 2011
Publication dateJul 26, 2016
Grant dateJul 26, 2016

How to read this patent

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  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

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  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

In an embodiment, the present invention discloses a EUV cleaner system and process for cleaning a EUV carrier. The euv cleaner system comprises separate dirty and cleaned environments, separate cleaning chambers for different components of the double container carrier, gripper arms for picking and placing different components using a same robot handler, gripper arms for holding different components at different locations, horizontal spin cleaning and drying for outer container, hot water and hot air (70 C) cleaning process, vertical nozzles and rasterizing megasonic nozzles for cleaning inner container with hot air nozzles for drying, separate vacuum decontamination chambers for outgassing different components, for example, one for inner and one for outer container with high vacuum (e.g., <10 −6 Torr) with purge gas, heaters and RGA sensors inside the vacuum chamber, purge gas assembling station, and purge gas loading and unloading station.

First claim

Opening claim text (preview).

What is claimed is: 1. A method for transferring a workpiece, wherein the workpiece comprises a first component and a second component, the method comprising: adjusting a distance between two gripper arms of a handler for gripping the first component; gripping the first component at a first portion on the gripper arms; transferring the first component to a first destination; adjusting the distance between two gripper arms for gripping the second component; gripping the second component at a second portion on the gripper arms, wherein the second portion is at a different location on the handler than the first portion; transferring the second component to a second destination, wherein an insert is coupled to an arm, wherein the first portion comprises a middle portion of the insert; and mating the first or second component with a locking mechanism. 2. A method as in claim 1 , further comprising: wherein the second portion comprises a top or bottom portion of the insert. 3. A method as in claim 1 , further comprising: wherein the first portion comprises a middle portion of an arm of the handler, and the second portion comprises a top or bottom portion of the arm of the handler, or wherein the first portion comprises a top or bottom portion of an arm of the handler, and the second portion comprises a middle portion of the arm of the handler. 4. A method as in claim 1 , further comprising: wherein the first and second destinations comprises different locations in a chamber. 5. A method as in claim 1 , further comprising: coupling a mechanism to the two arms, wherein the mechanism is configured to adjust a distance between the two arms. 6. A method as in claim 1 , further comprising: wherein the locking mechanism comprises a pin for mating with a recess on the first or second component. 7. A method as in claim 6 , further comprising: wherein the first component surrounds the second component.

Assignees

Inventors

Classifications

  • the wafers being placed on a robot blade or gripped by a gripper for conveyance · CPC title

  • characterised by movements or sequence of movements of transfer devices · CPC title

  • specially adapted for containing masks, reticles or pellicles · CPC title

  • comprising a chamber adapted to a particular process · CPC title

  • in-line arrangement · CPC title

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Frequently asked questions

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What does patent US9401270B2 cover?
In an embodiment, the present invention discloses a EUV cleaner system and process for cleaning a EUV carrier. The euv cleaner system comprises separate dirty and cleaned environments, separate cleaning chambers for different components of the double container carrier, gripper arms for picking and placing different components using a same robot handler, gripper arms for holding different compon…
Who is the assignee on this patent?
Brooks Ccs Gmbh, Brooks Automation Inc
What technology area does this patent fall under?
Primary CPC classification H10P72/0406. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Jul 26 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).