Surface treatment apparatus and method for semiconductor substrate
US-2015371845-A1 · Dec 24, 2015 · US
US9401270B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9401270-B2 |
| Application number | US-201514682059-A |
| Country | US |
| Kind code | B2 |
| Filing date | Apr 8, 2015 |
| Priority date | Jun 23, 2011 |
| Publication date | Jul 26, 2016 |
| Grant date | Jul 26, 2016 |
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In an embodiment, the present invention discloses a EUV cleaner system and process for cleaning a EUV carrier. The euv cleaner system comprises separate dirty and cleaned environments, separate cleaning chambers for different components of the double container carrier, gripper arms for picking and placing different components using a same robot handler, gripper arms for holding different components at different locations, horizontal spin cleaning and drying for outer container, hot water and hot air (70 C) cleaning process, vertical nozzles and rasterizing megasonic nozzles for cleaning inner container with hot air nozzles for drying, separate vacuum decontamination chambers for outgassing different components, for example, one for inner and one for outer container with high vacuum (e.g., <10 −6 Torr) with purge gas, heaters and RGA sensors inside the vacuum chamber, purge gas assembling station, and purge gas loading and unloading station.
Opening claim text (preview).
What is claimed is: 1. A method for transferring a workpiece, wherein the workpiece comprises a first component and a second component, the method comprising: adjusting a distance between two gripper arms of a handler for gripping the first component; gripping the first component at a first portion on the gripper arms; transferring the first component to a first destination; adjusting the distance between two gripper arms for gripping the second component; gripping the second component at a second portion on the gripper arms, wherein the second portion is at a different location on the handler than the first portion; transferring the second component to a second destination, wherein an insert is coupled to an arm, wherein the first portion comprises a middle portion of the insert; and mating the first or second component with a locking mechanism. 2. A method as in claim 1 , further comprising: wherein the second portion comprises a top or bottom portion of the insert. 3. A method as in claim 1 , further comprising: wherein the first portion comprises a middle portion of an arm of the handler, and the second portion comprises a top or bottom portion of the arm of the handler, or wherein the first portion comprises a top or bottom portion of an arm of the handler, and the second portion comprises a middle portion of the arm of the handler. 4. A method as in claim 1 , further comprising: wherein the first and second destinations comprises different locations in a chamber. 5. A method as in claim 1 , further comprising: coupling a mechanism to the two arms, wherein the mechanism is configured to adjust a distance between the two arms. 6. A method as in claim 1 , further comprising: wherein the locking mechanism comprises a pin for mating with a recess on the first or second component. 7. A method as in claim 6 , further comprising: wherein the first component surrounds the second component.
the wafers being placed on a robot blade or gripped by a gripper for conveyance · CPC title
characterised by movements or sequence of movements of transfer devices · CPC title
specially adapted for containing masks, reticles or pellicles · CPC title
comprising a chamber adapted to a particular process · CPC title
in-line arrangement · CPC title
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