Cell analysis by mass cytometry
US-9435787-B2 · Sep 6, 2016 · US
US9396918B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9396918-B2 |
| Application number | US-201414534335-A |
| Country | US |
| Kind code | B2 |
| Filing date | Nov 6, 2014 |
| Priority date | Nov 6, 2013 |
| Publication date | Jul 19, 2016 |
| Grant date | Jul 19, 2016 |
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A sample plate in use with a MALDI-TOF (matrix-assisted laser desorption ionization time-of-flight) mass spectrometer. The sample plate is usable for the mass spectrometry of a polymeric material on the order of several hundreds of Da and a method of manufacturing the same sample plate. The sample plate including a target plate, an organic matrix formed on one surface of the target plate, and a Parylene thin film formed on the target plate on which the organic matrix is formed, the Parylene thin film entirely covering the organic matrix.
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What is claimed is: 1. A sample plate comprising: a target plate; an organic matrix formed on one surface of the target plate; and a Parylene-N thin film formed on the target plate on which the organic matrix is formed, the Parylene-N thin film entirely covering the organic matrix. 2. The sample plate according to claim 1 , further comprising a subject to be analyzed formed on the Parylene-N thin film. 3. The sample plate according to claim 2 , wherein a molecular weight of the subject to be analyzed ranges from 100 to 1,000 Da. 4. The sample plate according to claim 1 , wherein the Parylene-N thin film comprises a deposition film having a thickness ranging from 10 to 100 nm. 5. The sample plate according to claim 1 , wherein the sample plate is to be in use with a MALDI-TOF mass spectrometer. 6. A method of manufacturing a sample plate comprising: forming an organic matrix on one surface of a target plate; and forming a Parylene-N thin film on the target plate on which the organic matrix is formed such that the Parylene-N thin film entirely covers the organic matrix. 7. The method according to claim 6 , further comprising forming a subject to be analyzed on the Parylene-N thin film. 8. The method according to claim 6 , wherein the Parylene-N thin film is deposited at a thickness ranging from 10 to 100 nm. 9. The method according to claim 6 , wherein forming the Parylene-N thin film comprises: evaporating Parylene by heating a Parylene dimer; forming an intermediate by pyrolyzing the evaporated Parylene dimer; and introducing the intermediate into a deposition chamber, thereby depositing a Parylene-N thin film on the target plate on which the organic matrix is formed.
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