Composition for forming antistatic film and oligomer compound

Patent metadata

Field	Value
Publication number	US-9394231-B2
Application number	US-201214362851-A
Country	US
Kind code	B2
Filing date	Nov 12, 2012
Priority date	Dec 5, 2011
Publication date	Jul 19, 2016
Grant date	Jul 19, 2016

Abstract

A composition for forming an antistatic film, includes: an oligomer compound of Formula (1A):

(where R 1 is a hydrogen atom or a group of Formula (2), each of R 2 and R 3 is independently a hydrogen atom, a group of Formula (3), or a group of Formula (4), at least one of the plurality of Rs is a sulfo group, a and b are positive integers satisfying 2≦(a+b)≦6; and each of a plurality of xs is independently an integer from 0 to 4):

(where n is an integer satisfying 1≦n<(a+b+4); a, b, a plurality of Rs, and x are the same as those in Formula (1A); and each of a plurality of ys is independently an integer from 0 to 5); and water.

First claim

The invention claimed is:

1. A method for manufacturing an aniline oligomer compound of Formula (1C′):

where a and b are positive integers satisfying 2≦(a+b)≦3, the method comprising:
causing a triphenylamine derivative of Formula (1D) to react with an amine compound of Formula (1E) in the presence of a metal complex catalyst and a base:

where X is a leaving functional group, and m is 2 or 3.

2. The method for manufacturing according to claim 1 wherein
the leaving functional group is a group selected from the group consisting of a halogen atom, a methanesulfonyloxy group, a benzenesulfonyloxy group, a toluenesulfonyloxy group, a trifluoromethanesulfonyloxy group, and a nonafluorobutanesulfonyloxy group.

3. The method for manufacturing according to claim 2 , wherein
the leaving functional group is selected from the group consisting of a chlorine atom, a bromine atom, and an iodine atom.

4. The method for manufacturing according to claim 1 wherein
the metal complex catalyst is a palladium complex.

5. A method for manufacturing an aniline oligomer compound of Formula (1F), the method comprising:
causing a triphenylamine derivative of Formula (1D) to react with an amine compound of Formula (1E) in the presence of a metal complex catalyst and a base:

where x is a leaving functional group, and m′ is an integer from 1 to 33.

6. The method for manufacturing according to claim 5 , wherein
the leaving functional group is a group selected from the group consisting of a halogen atom, a methanesulfonyloxy group, a benzenesulfonyloxy group, a toluenesulfonyloxy group, a trifluoromethanesulfonyloxy group, and a nonafluorobutanesulfonyloxy group.

7. The method for manufacturing according to claim 6 , wherein
the leaving functional group is selected from the group consisting of a chlorine atom, a bromine atom, and an iodine atom.

8. The method for manufacturing according to claim 5 , wherein
the metal complex catalyst is a palladium complex.

Assignees

• Nissan Chemical Ind Ltd

Inventors

• Nishita Tokio
• Mizuochi Ryuta
• Sakamoto Rikimaru
• Yamada Tomohisa
• Nakaie Naoki
• Takayama Yuki

Classifications

• G03F1/00

  Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof · CPC title

• H01B1/128

  comprising six-membered aromatic rings in the main chain, e.g. polyanilines, polyphenylenes · CPC title

• G03F7/093

  characterised by antistatic means, e.g. for charge depletion · CPC title

• C07C211/54 Primary

  having amino groups bound to two or three six-membered aromatic rings · CPC title

• G03F7/11

  having cover layers or intermediate layers, e.g. subbing layers {(G03F7/091 - G03F7/093, B41N3/03 take precedence)} · CPC title