Liquid processing apparatus and cleaning method

Patent metadata

Field	Value
Publication number	US-9387520-B2
Application number	US-201313941770-A
Country	US
Kind code	B2
Filing date	Jul 15, 2013
Priority date	Jul 26, 2012
Publication date	Jul 12, 2016
Grant date	Jul 12, 2016

Abstract

Disclosed are a liquid processing apparatus and a cleaning method which may perform cleaning on a portion which is not in the vicinity of a drain section in an exhaust route. The liquid processing apparatus includes an exhaust section provided in vicinity of the drain section, which is configured to exhaust a surrounding atmosphere of the substrate held by the substrate holding unit; an exhaust route forming member configured to form an exhaust route reaching the exhaust section; and a first cleaning unit configured to supply a cleaning liquid to the exhaust route forming member at the exhaust route side.

First claim

What is claimed is:

1. A liquid processing apparatus comprising:
a substrate holding unit configured to hold a substrate horizontally;
a substrate rotating mechanism configured to rotate the substrate holding unit;
a processing liquid supply unit configured to supply a processing liquid to the substrate held by the substrate holding unit;
a guide cup provided to surround the substrate holding unit;
a drain section configured to recover the processing liquid supplied to the substrate;
an exhaust section provided in vicinity of the drain section and configured to exhaust the surrounding atmosphere of the substrate held by the substrate holding unit;
an exhaust route forming member provided between a first area configured to process the substrate held by the substrate holding unit with the processing liquid and a second area in which the drain section and the exhaust section are provided, a gap being provided between the exhaust route forming member and the guide cup, and an exhaust route reaching the exhaust section being formed by the guide cup and the exhaust route forming member;
a first cleaning unit configured to supply a cleaning liquid to the exhaust route forming member at a second area side; and
a second cleaning unit configured to supply the cleaning liquid to the exhaust route forming member at a first area side,
wherein the exhaust route forming member is formed with a recess at the first area side and provided with a through hole at a bottom surface of the recess,
the second cleaning unit supplies the cleaning liquid to a top surface side of the exhaust route forming member and to a portion of the substrate holding unit that faces the exhaust route forming member, and the cleaning liquid supplied toward the substrate holding unit is sent to the drain section via the through hole of the exhaust route forming member.

2. The liquid processing apparatus of claim 1 , wherein the first cleaning unit is a nozzle configured to supply the cleaning liquid in a droplet state.

3. The liquid processing apparatus of claim 1 , wherein the first cleaning unit is configured to supply the cleaning liquid to at least a portion of the exhaust route forming member at an inner side than the drain section in a radial direction.

4. The liquid processing apparatus of claim 1 , wherein the exhaust route forming member is provided with a guide plate which downwardly extends from the exhaust route forming member, and
the first cleaning unit is configured to supply the cleaning liquid to at least a portion at a downstream side of the guide plate in an exhaust direction of the exhaust route.

5. The liquid processing apparatus of claim 1 , wherein the first cleaning unit is disposed at an inner side than the drain section in a radial direction.

6. The liquid processing apparatus of claim 1 , wherein the first cleaning unit includes a nozzle provided within the second area disposed at an inner side than the drain section in a radial direction and including a plurality of first ejection holes arranged at intervals in a circumferential direction, and each of the first ejection holes ejects the cleaning liquid radially outwards and slantly upwards, toward a bottom surface of the exhaust route forming member.

7. The liquid processing apparatus of claim 6 , wherein a guide protrusion protruding toward the drain section is provided at an outer peripheral portion of the bottom surface of the exhaust route forming member,
the guide protrusion is configured to guide a liquid included in a gas-liquid multiphase flow that flows down from the first area toward the drain section, and to guide gas included in the gas-liquid multiphase flow to an inner side than the guide protrusion of the exhaust route in a radial direction, and
in the bottom surface of the exhaust route forming member, a section extending from a cleaning liquid collision position to the guide protrusion is formed in a slope of which the height decreases toward the radial outside, the cleaning liquid collision position being a position where the cleaning liquid ejected from each of the first ejection holes collides.

8. The liquid processing apparatus of claim 6 , wherein the first cleaning unit includes a nozzle provided within the second area which is at an inner side than the drain section in a radial direction and formed with a plurality of second ejection holes arranged at intervals in a circumferential direction, and each of the second ejection holes supplies the cleaning liquid toward a wall body that partitions the drain section.

9. The liquid processing apparatus of claim 1 , wherein the second cleaning unit includes a plurality of ejection holes provided at different positions in a radial direction of the exhaust route forming member.

10. The liquid processing apparatus of claim 1 , wherein the second cleaning unit is disposed at an inner side than the drain section in a radial direction.

Assignees

• Tokyo Electron Ltd

Inventors

• Ogata Nobuhiro
• Wakiyama Terufumi
• Kai Yoshihiro
• Kamo Ryouga
• Ikeda Yoshinori

Classifications

• H10P72/0414 Primary

  using mainly spraying means, e.g. nozzles · CPC title

• H10P50/00 Primary

  Etching of wafers, substrates or parts of devices · CPC title

• B08B3/04 Primary

  Cleaning involving contact with liquid · CPC title

• H01L21/67051

  Electricity · mapped topic