Grazing incidence reflectors, lithographic apparatus, methods for manufacturing a grazing incidence reflector and methods for manufacturing a device

Patent metadata

Field	Value
Publication number	US-9377695-B2
Application number	US-201213983214-A
Country	US
Kind code	B2
Filing date	Jan 18, 2012
Priority date	Feb 24, 2011
Publication date	Jun 28, 2016
Grant date	Jun 28, 2016

Abstract

A grazing incidence reflector ( 300 ) for EUV radiation includes a first mirror layer ( 310 ) and a multilayer mirror structure ( 320 ) beneath the first mirror layer. The first mirror layer reflects at least partially EUV radiation incident on the reflector with grazing incidence angles in a first range, and the first mirror layer transmits EUV radiation in a second range of incidence angles, which overlaps and extends beyond the first range of incidence angles. The multilayer mirror structure reflects EUV radiation that is incident on the reflector with grazing incidence angles in a second range that penetrates through the first mirror layer. A grazing incidence reflector can be used in a lithographic apparatus and in manufacturing a device by a lithographic process.

First claim

The invention claimed is:

1. A grazing incidence reflector for extreme ultraviolet (EUV) radiation, comprising:
a first mirror layer configured to reflect at least partially EUV radiation incident on the reflector with grazing incidence angles in a first range, the first mirror layer being configured to transmit EUV radiation in a second range of incidence angles which overlaps and extends beyond the first range of incidence angles;
a multilayer mirror structure beneath the first mirror layer configured to reflect EUV radiation which is incident on the reflector with grazing incidence angles in said second range and which penetrates through the first mirror layer; and
a second mirror layer on top of the first mirror layer, the second mirror layer being configured to provide enhanced reflectance for EUV radiation with grazing incidence angles in a third range which is within the first range of angles.

2. The grazing incidence reflector according to claim 1 , wherein the first mirror layer has a thickness of less than 20 nm.

3. The grazing incidence reflector according to claim 1 , wherein the second mirror layer has a thickness of less than 10 nm and has a reflectance greater than 40% over a range of grazing incidence angles extending from 0 degree to less than 10 degrees.

4. The grazing incidence reflector according to claim 1 ,
wherein the first mirror layer occupies only a portion of a surface of the multilayer mirror structure so as to provide enhanced reflectance for EUV radiation with grazing incidence angles in the second range.

5. The grazing incidence reflector according to claim 1 , wherein the reflector is configured for operation at EUV wavelengths in the range 6-7 nm.

6. The grazing incidence reflector according to claim 5 , wherein the first mirror layer has a thickness in the range 15-17 nm and is made of ThO 2 , and has a reflectance greater than 40% over the first range of grazing incidence angles between greater than 0 degree and less than 12 degrees.

7. The grazing incidence reflector according to claim 6 , wherein:
the second range of grazing incidence angles is greater than or equal to 12 degrees and less than or equal to 14 degrees; and
the multilayer mirror structure is formed of a number of laminated elements, each laminated element having a first sub-unit and a second sub-unit on top of the first sub-unit, the second sub-unit having a lower index of refraction than that of the first sub-unit.

8. The grazing incidence reflector according to claim 7 , wherein materials of the first sub-unit and the second sub-unit are selected from a group of Th, La, U, B, nitrides, oxides, borides, fluorides of heavy metal elements, and carbides of light elements.

9. The grazing incidence reflector according to claim 1 , wherein the reflector is configured for operation at EUV wavelengths in the range 13-14 nm.

10. The grazing incidence reflector according to claim 9 , wherein the first mirror layer has a thickness in the range 15-17 nm and is made of Ru, and has a reflectance greater than 40% over the first range of grazing incidence angles between greater than 0 degree and less than 25 degrees.

11. The grazing incidence reflector according to claim 10 , wherein:
the second range of grazing incidence angles is greater than or equal to 25 degrees and less than or equal to 30 degrees; and
the multilayer mirror structure is formed of a number of laminated elements, each laminated element having a first sub-unit and a second sub-unit on top of the first sub-unit, the second sub-unit having a lower index of refraction than that of the first sub-unit.

12. The grazing incidence reflector according to claim 11 , wherein materials of the first sub-unit and the second sub-unit are selected from a group of Mo, Si, Ru and diamond-like carbon.

13. The grazing incidence reflector according to claim 1
wherein at least one of a period and a composition of the multilayer mirror structure varies across the multilayer mirror structure so that a grazing incidence angle of maximal reflectance varies across the multilayer mirror structure.

14. A lithographic apparatus comprising a grazing incidence reflector comprising:
a first mirror layer configured to reflect at least partially EUV radiation incident on the reflector with grazing incidence angles in a first range, the first mirror layer being configured to transmit EUV radiation in a second range of incidence angles which overlaps and extends beyond the first range of incidence angles;
a multilayer mirror structure beneath the first mirror layer configured to reflect EUV radiation which is incident on the reflector with grazing incidence angles in said second range and which penetrates through the first mirror layer, and
a second mirror layer on top of the first mirror layer, the second mirror layer being configured to provide enhanced reflectance for EUV radiation with grazing incidence angles in a third range which is within the first range of angles.

15. A method for manufacturing a grazing incidence reflector configured to reflect extreme ultraviolet (EUV) radiation, the method comprising:
disposing a first mirror layer on top of a multilayer mirror structure and a surface structure on top of the multilayer mirror structure; and
disposing a second mirror layer on top of the first mirror layer; wherein the first mirror layer is configured to at least partially reflect EUV radiation incident on the reflector with grazing incidence angles in a first range, the first mirror layer being configured to transmit EUV radiation in a second range of incidence angles which overlaps and extends beyond the first range of incidence angles, and the second mirror layer being configured to provide enhanced reflectance for EUV radiation with grazing incidence angles in a third range which is within the first range of angles; and
the multilayer mirror structure is configured to reflect EUV radiation which is incident on the reflector with grazing incidence angles in said second range and which penetrates through the first mirror layer.

16. A method for manufacturing a device by a lithographic process, comprising:
illuminating a patterning device with extreme ultraviolet (EUV) radiation from an EUV source via an illumination system; and
projecting an image of the patterning device onto a substrate by projection of said EUV radiation via projection system;
wherein at least one of the illumination system or the projection system comprises a grazing incidence reflector for:
reflecting at least partially EUV radiation incident on the reflector with grazing incidence angles in a first range with a first mirror layer being configured to transmit EUV radiation in a second range of incidence angles which overlaps and extends beyond the first range of incidence angles;
providing enhanced reflectance for EUV radiation with grazing incidence angles in a third range which is within the first range of angles with a second mirror layer on top of the first mirror layer; and
reflecting EUV radiation which is incident on the reflector with grazing incidence angles in said second range and which penetrates through the first mirror layer with a multilayer mirror structure beneath the first mirror layer.

17. A method for manufacturing a grazing incidence reflector configured to reflect extreme ultraviolet (EUV) radiation, the method comprising:
disposing a first mirror layer on top of a multilayer mirror structure and a surface structure on top of the multilayer mirror structure;
wherein the first mirror layer is configured to at least partially reflect

Assignees

• Yakunin Andrei Mikhailovich
• Banine Vadim Yevgenyevich
• Frijns Olav Waldemar Vladimir
• Asml Netherlands Bv

Inventors

• Yakunin Andrei Mikhailovich
• Banine Vadim Yevgenyevich
• Frijns Olav Waldemar Vladimir

Classifications

• G02B5/0891

  Ultraviolet [UV] mirrors (apparatus for microlithography exposure G03F7/70; X-ray multilayer structures G21K1/06) · CPC title

• G03F7/702 Primary

  Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems · CPC title

• B82Y10/00 Primary

  Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic · CPC title

• G03F7/70058 Primary

  Mask illumination systems · CPC title

• G21K2201/061

  characterised by a multilayer structure · CPC title