Plasma generation apparatus

US9377004B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9377004-B2
Application numberUS-201514631142-A
CountryUS
Kind codeB2
Filing dateFeb 25, 2015
Priority dateAug 28, 2012
Publication dateJun 28, 2016
Grant dateJun 28, 2016

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

The present invention addresses the issue of improving generation efficiency of plasma in relation to usage power in a plasma generation apparatus. The present invention is directed to a plasma generation apparatus provided with an electromagnetic wave emission antenna and a discharge electrode. The plasma generation apparatus includes a plasma control device that controls generation of plasma, and is characterized that the plasma control device causes the electromagnetic wave emission antenna to intermittently emit electromagnetic waves by way of a drive sequence control. Especially, the plasma control device may preferably control an oscillating frequency, a power, output timing, a pulse width, a pulse cycle, and a duty cycle of the electromagnetic waves.

First claim

Opening claim text (preview).

What is claimed is: 1. A plasma generation apparatus having an electromagnetic wave emission antenna and a discharge electrode comprising: a plasma control device that controls generation of plasma, wherein the plasma generation apparatus is characterized in that the plasma control device causes the electromagnetic wave emission antenna to intermittently emit an electromagnetic wave by way of a drive sequence control; wherein the plasma control device is subject to a programmed control in accordance with generation efficiency of the plasma; and wherein the generation efficiency of the plasma is represented by at least one index value selected from among a group of index values including a radical light emission amount, a temperature, an electron temperature, an electron density, and a reflected wave power. 2. A plasma generation apparatus having an electromagnetic wave emission antenna and a discharge electrode comprising: a plasma control device that controls generation of plasma, wherein the plasma generation apparatus is characterized in that the plasma control device causes the electromagnetic wave emission antenna to intermittently emit an electromagnetic wave by way of a drive sequence control; wherein the plasma generation apparatus is applied to an internal combustion engine; and wherein the plasma control device performs a control during a cold start of an internal combustion engine so as to limit fuel injection and emit an electromagnetic wave for raising a temperature in the vicinity of a discharge device of the internal combustion engine.

Assignees

Inventors

Classifications

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US9377004B2 cover?
The present invention addresses the issue of improving generation efficiency of plasma in relation to usage power in a plasma generation apparatus. The present invention is directed to a plasma generation apparatus provided with an electromagnetic wave emission antenna and a discharge electrode. The plasma generation apparatus includes a plasma control device that controls generation of plasma,…
Who is the assignee on this patent?
Imagineering Inc
What technology area does this patent fall under?
Primary CPC classification F02P23/045. Mapped technology areas include Mechanical Engineering.
When was this patent published?
Publication date Tue Jun 28 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).