Demagnetization of magnetic media by C doping for HDD patterned media application

US9376746B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9376746-B2
Application numberUS-201213715786-A
CountryUS
Kind codeB2
Filing dateDec 14, 2012
Priority dateDec 16, 2011
Publication dateJun 28, 2016
Grant dateJun 28, 2016

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Embodiments described herein provide methods and apparatus for treating a magnetic substrate having an imprinted, oxygen-reactive mask formed thereon by implanting ions into a magnetically active surface of the magnetic substrate through the imprinted oxygen-reactive mask, wherein the ions do not reduce the oxygen reactivity of the mask, and removing the mask by exposing the substrate to an oxygen-containing plasma. The mask may be amorphous carbon, through which carbon-containing ions are implanted into the magnetically active surface. The carbon-containing ions, which may also contain hydrogen, may be formed by activating a mixture of hydrocarbon gas and hydrogen. A ratio of the hydrogen and the hydrocarbon gas may be selected or adjusted to control the ion implantation.

First claim

Opening claim text (preview).

What is claimed is: 1. A method of forming a patterned magnetic substrate, comprising: forming a patterned oxygen-reactive mask comprising amorphous carbon on a magnetically active surface of a magnetic substrate, wherein the patterned oxygen-reactive mask defines exposed portions of the magnetically active surface; implanting carbon ions from a carbon containing plasma through the patterned oxygen-reactive mask into the exposed portions of the magnetically active surface of the magnetic substrate, wherein the carbon ions do not reduce the oxygen reactivity of the patterned oxygen-reactive mask; and removing the patterned oxygen-reactive mask by exposing the substrate to an oxygen-containing plasma. 2. The method of claim 1 , wherein the carbon ions are derived from a hydrocarbon gas. 3. The method of claim 2 , wherein the carbon containing plasma is a circulating plasma formed from the hydrocarbon gas. 4. The method of claim 3 , wherein the carbon ions comprise hydrogen. 5. The method of claim 1 , wherein the carbon containing plasma is a circulating plasma formed from a gas mixture comprising hydrocarbon gas. 6. The method of claim 5 , wherein the gas mixture further comprises B 2 H 6 . 7. The method of claim 5 , wherein the gas mixture further comprises hydrogen gas. 8. The method of claim 7 , wherein a ratio of the hydrogen gas to the hydrocarbon gas is selected or adjusted to control the ion implantation. 9. The method of claim 5 , wherein the oxygen-reactive mask comprises a hardmask and a resist.

Assignees

Inventors

Classifications

  • Removal of material · CPC title

  • Carbon · CPC title

  • Producing a magnetic layer by electro-plating or electroless plating · CPC title

  • C23C14/042Primary

    using masks · CPC title

  • Record carriers characterised by the selection of the material · CPC title

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What does patent US9376746B2 cover?
Embodiments described herein provide methods and apparatus for treating a magnetic substrate having an imprinted, oxygen-reactive mask formed thereon by implanting ions into a magnetically active surface of the magnetic substrate through the imprinted oxygen-reactive mask, wherein the ions do not reduce the oxygen reactivity of the mask, and removing the mask by exposing the substrate to an oxy…
Who is the assignee on this patent?
Hilkene Martin A, Gouk Roman, Scotney-Castle Matthew D, and 2 more
What technology area does this patent fall under?
Primary CPC classification C23C14/042. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jun 28 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).