System and method for replacing resist filter to reduce resist filter-induced wafer defects

Patent metadata

Field	Value
Publication number	US-9375665-B2
Application number	US-201314075923-A
Country	US
Kind code	B2
Filing date	Nov 8, 2013
Priority date	Mar 20, 2007
Publication date	Jun 28, 2016
Grant date	Jun 28, 2016

Abstract

System and method for replacing a resist filter in such a manner as to reduce filter-induced wafer defects are described. In one embodiment, the system comprises a filtration system connected to a dispenser, the filtration system comprising a filter; and a switch connected to the filter for selectively connecting the filtration system to throughput one of a first chemical solution and a second chemical solution.

First claim

What is claimed is:

1. An apparatus for facilitating replacement of a resist filter of a filtration system, the apparatus comprising:
a first dispenser containing photoresist solution;
a second dispenser containing organic solvent capable of dissolving the photoresist solution;
a two-inlet isolation valve configured to move from a first position to a second position to flush the organic solvent contained in the second dispenser through a resist filter to clean and pre-wet the resist filter, and move from the second position to the first position to allow the photoresist solution in the first dispenser to flow through the filtration system; and
a feed pump configured to receive the photoresist solution from the first dispenser and pump the photoresist solution toward the two-inlet isolation valve;
a supply line connecting the second dispenser to the two-inlet isolation valve such that the supply line is configured to allow the organic solvent to flow therethrough from the second dispenser to the two-inlet isolation valve;
a dispense pump configured to receive the photoresist solution and the organic solvent from the two-inlet isolation valve; and
a recirculation pathway configured to receive unused photoresist solution from the dispense pump and recirculate the unused photoresist solution to the feed pump without accessing either of the first and second dispensers, wherein the recirculation pathway is further configured to receive organic solvent from the dispense pump and recirculate organic solvent to the feed pump without accessing the supply line, wherein the two-inlet isolation valve is disposed on a fluid pathway between the feed pump and the recirculation pathway.

2. The apparatus of claim 1 , wherein the resist filter is replaceable.

3. The apparatus of claim 1 , wherein a position of the two-inlet isolation valve is controlled manually.

4. The apparatus of claim 1 , wherein a position of the two-inlet isolation valve is controlled via software.

5. The apparatus of claim 1 , wherein the two-inlet isolation valve is in the first position during normal operation, wherein the dispense pump is further configured to direct photoresist solution to an outlet valve when the two-inlet isolation valve is in the first position, wherein the dispense pump is further configured to direct organic solvent to the recirculation pathway when the two-inlet isolation valve is in the second position.

6. An apparatus comprising:
a first dispenser containing a photoresist solution;
a second dispenser of organic solvent capable of dissolving the photoresist solution;
a filtration system comprising a replaceable filter;
a two-inlet isolation valve configured to move from a first position to a second position to flush the organic solvent contained in the second dispenser through the replaceable filter to clean and pre-wet the replaceable filter, and move from the second position to the first position to allow the photoresist solution in the first dispenser to flow through the filtration system; and
a feed pump configured to receive the photoresist solution from the first dispenser and pump the photoresist solution toward the two-inlet isolation valve;
a supply line connecting the second dispenser to the two-inlet isolation valve such that the supply line is configured to allow the organic solvent to flow therethrough from the second dispenser to the two-inlet isolation valve;
a dispense pump configured to receive the photoresist solution and the organic solvent from the two-inlet isolation valve; and
a recirculation pathway configured to receive unused photoresist solution from the dispense pump and recirculate the unused photoresist solution to the feed pump without accessing either of the first and second dispensers, wherein the recirculation pathway is further configured to receive organic solvent from the dispense pump and recirculate organic solvent to the feed pump without accessing the supply line, wherein the two-inlet isolation valve is disposed on a fluid pathway between the feed pump and the recirculation pathway.

7. The apparatus of claim 6 , wherein a position of the two-inlet isolation valve is controlled manually.

8. The apparatus of claim 6 , wherein a position of the two-inlet isolation valve is controlled via software.

9. The apparatus of claim 6 , wherein the filtration system is connected to throughput the photoresist solution during normal operation of the apparatus.

10. The apparatus of claim 6 , wherein the second dispenser is connected to throughput the organic solvent substantially contemporaneously with replacement of the replaceable filter.

11. The apparatus of claim 6 , wherein the two-inlet isolation valve is configured to move from the second position to the first position to allow the photoresist solution to flow through the filtration system.

12. The apparatus of claim 6 , further comprising:
a vent valve connected to the filtration system.

13. A device comprising:
a first dispenser containing a photoresist solution;
a second dispenser containing an organic solvent;
a filtration system coupled to a two-inlet isolation valve, the filtration system including a replaceable filter;
the two-inlet isolation valve configured to move from a first position to a second position to flush the organic solvent contained in the second dispenser through the replaceable filter to clean and pre-wet the replaceable filter, and move from the second position to the first position to allow the photoresist solution in the first dispenser to flow through the replaceable filter; and
a feed pump configured to receive the photoresist solution from the first dispenser and pump the photoresist solution toward the two-inlet isolation valve;
a supply line connecting the second dispenser to the two-inlet isolation valve such that the supply line is configured to allow the organic solvent to flow therethrough from the second dispenser to the two-inlet isolation valve;
a coater configured to receive the photoresist solution and the organic solvent from the two-inlet isolation valve, wherein the coater is configured to dispense the photoresist solution onto a wafer; and
a recirculation pathway configured to receive unused photoresist solution from the coater and recirculate the unused photoresist solution to the feed pump without traversing through either of the first and second dispensers, wherein the recirculation pathway is further configured to receive organic solvent from the coater and recirculate organic solvent to the feed pump without accessing the supply line, wherein the two-inlet isolation valve is disposed on a fluid pathway between the feed pump and the recirculation pathway.

14. The device of claim 13 , wherein the coater includes a dispense pump configured to dispense the photoresist solution onto the wafer.

15. The device of claim 13 , further comprising a recirculation valve positioned between the coater and the recirculation pathway.

16. The device of claim 13 , wherein the first dispenser is coupled to the feed pump through a first pathway, and
wherein the recirculation pathway intersects the first pathway.

17. The device of claim 13 , further comprising a barrier valve positioned between the two-inlet isolation valve and the coater.

18. The device of claim 13 , wherein the replaceable filter is positioned between the two-inlet isolation valve and the barrier valve such that the photoresist solution and the organic solvent flow through the replaceable filter prior to reaching the barrier valve.

19. The device of cl

Assignees

• Taiwan Semiconductor Mfg

Inventors

• Kao Yao-Hwan
• Huang Po-Chang

Classifications

• B01D35/02 Primary

  Filters adapted for location in special places, e.g. pipe-lines, pumps, stop-cocks, (B01D35/05 takes precedence; {water pipe system filters E03B3/18, E03B7/07; dirt catchers in sewers E03F; filters or strainers for pipe-lines in general B08B, E03F; object or dirt catching devices in sinks or the like E03C1/26; suction strainers or filters for pumps F04B53/005, F04D29/70}) · CPC title

• G03F7/3092

  Recovery of material; Waste processing · CPC title

• G03F7/162 Primary

  Coating on a rotating support, e.g. using a whirler or a spinner · CPC title