Substrate liquid processing apparatus for separating processing solution and atmosphere from each other within collection cup

Patent metadata

Field	Value
Publication number	US-9355871-B2
Application number	US-201213541831-A
Country	US
Kind code	B2
Filing date	Jul 5, 2012
Priority date	Jul 6, 2011
Publication date	May 31, 2016
Grant date	May 31, 2016

Abstract

A substrate liquid processing apparatus is provided, in which a processing solution and an atmosphere can be separated from each other within a collection cup. The substrate liquid processing apparatus includes: a substrate rotation unit; a processing solution supply unit; a collection cup configured to collect the processing solutions; liquid collection regions formed at the collection cup; a liquid drain opening formed at a bottom portion of the collection cup; an exhaust opening formed above the liquid drain opening; a fixed cover configured to cover an upper portion of the exhaust opening with a space therebetween; an elevating cup provided above the fixed cover and configured to guide the processing solutions into the liquid collection regions; and a cup elevating unit configured to move up and down the elevating cup depending on the kinds of the processing solutions.

First claim

What is claimed is:

1. A substrate liquid processing apparatus configured to perform a liquid process on a substrate with a processing solution, the substrate liquid processing apparatus comprising:
a substrate rotation unit configured to hold and rotate a substrate within a processing space;
a processing solution supply unit configured to selectively supply plural kinds of processing solutions to the substrate;
a collection cup configured to collect the processing solutions supplied to the substrate;
a plurality of liquid collection regions formed at the collection cup and configured to collect the processing solutions;
at least one liquid drain opening formed at a bottom portion of the collection cup and configured to discharge the processing solutions collected in the liquid collection regions;
at least one exhaust opening formed above the at least one liquid drain opening of the collection cup;
at least one fixed cover fixed to the collection cup and configured to cover an upper portion of the at least one exhaust opening with a predetermined space therebetween, such that the at least one exhaust opening is entirely covered by the at least one fixed cover when viewed from above;
at least one elevating cup provided above the at least one fixed cover and configured to guide the processing solutions supplied to the substrate into the liquid collection regions; and
at least one cup elevating unit configured to move up and down the at least one elevating cup with respect to the at least one fixed cover depending on the kinds of the processing solutions,
wherein the at least one fixed cover is includes at least one supporting protrusion at a top portion thereof,
the at least one elevating cup includes at least one supporting recess at a bottom portion thereof, and
the at least one supporting protrusion of the at least one fixed cover is configured to be inserted into the at least one supporting recess of the at least one elevating cup, and
the predetermined space between the at least one fixed cover and the at least one exhaust opening is maintained constant when the at least one elevating cup moves up and down.

2. The substrate liquid processing apparatus of claim 1 ,
wherein the at least one liquid drain opening is plural in number, the liquid drain openings are respectively formed at bottom portions of the liquid collection regions, and the number of the liquid drain openings corresponds to the number of the kinds of the processing solutions supplied from the processing solution supply unit.

3. The substrate liquid processing apparatus of claim 2 ,
wherein the at least one cup elevating unit moves up and down the at least one elevating cup, so that the processing space communicates with one of the liquid drain openings.

4. The substrate liquid processing apparatus of claim 1 ,
wherein when the at least one elevating cup is moved up, a lower end of the at least one supporting recess is positioned to be lower than an upper end of the at least one fixed cover.

5. The substrate liquid processing apparatus of claim 1 ,
wherein at least one cover member protruding toward an upper area and a side area of the at least one exhaust opening is provided at the at least one fixed cover.

6. The substrate liquid processing apparatus of claim 1 ,
wherein the at least one exhaust opening is plural in number, and the exhaust openings communicate with each other at a bottom portion of the collection cup.

7. The substrate liquid processing apparatus of claim 1 ,
wherein the at least one exhaust opening is provided between adjacent the liquid collection regions.

8. The substrate liquid processing apparatus of claim 1 ,
wherein the liquid collection regions are partitioned by at least one partition wall at which the at least one exhaust opening is formed.

Assignees

• Higashijima Jiro
• Ito Norihiro
• Ogata Nobuhiro
• Nagamine Shuichi
• Tokyo Electron Ltd

Inventors

• Higashijima Jiro
• Ito Norihiro
• Ogata Nobuhiro
• Nagamine Shuichi

Classifications

• H10P72/0448

  Apparatus for applying a liquid, a resin, an ink or the like · CPC title

• H10P72/0424

  using mainly spraying means, e.g. nozzles · CPC title

• H10P72/0414

  using mainly spraying means, e.g. nozzles · CPC title

• H10P72/0402 Primary

  Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence) · CPC title

• B05B15/0406

  Operations & Transport · mapped topic