Apparatus for monitoring deposition rate, apparatus provided with the same for depositing organic layer, method of monitoring deposition rate, and method of manufacturing organic light emitting display apparatus using the same

Patent metadata

Field	Value
Publication number	US-9347886-B2
Application number	US-201314079522-A
Country	US
Kind code	B2
Filing date	Nov 13, 2013
Priority date	Jun 24, 2013
Publication date	May 24, 2016
Grant date	May 24, 2016

Abstract

An apparatus for monitoring deposition rate, an apparatus including the same, for depositing an organic layer, a method of monitoring deposition rate, and a method of manufacturing an organic light emitting display apparatus using the same, are provided. The deposition rate monitoring apparatus for measuring deposition rate of a deposition material discharged from a deposition source, includes: a light source for irradiating light having a wavelength within a photoexcitation bandwidth of the deposition material; a first optical system for irradiating the light emitted from the light source toward the discharged deposition material; a second optical system for collecting the light emitted from the deposition material; and a first light sensor for detecting the amount of the light which is emitted from the deposition material and collected in the second optical system.

First claim

What is claimed is:

1. A deposition rate monitoring method for measuring a deposition rate of a deposition material discharged from a deposition source, the method comprising:
emitting light having a wavelength within a photo excitation bandwidth of the deposition material from a light source;
irradiating the light emitted from the light source toward the deposition material discharged from the deposition source; and
detecting an amount of light emitted from the deposition material which is excited by the irradiated light,
wherein the light emitted from the light source is irradiated toward a nozzle of the deposition source from which the deposition material is discharged.

2. The deposition rate monitoring method of claim 1 , wherein the emitting of the light from the light source comprises selectively emitting only the light having a wavelength for exciting the deposition material from the light source.

3. The deposition rate monitoring method of claim 1 , wherein the detecting of the light comprises detecting an amount of fluorescence emitted from the deposition material which is excited by the irradiated light.

4. The deposition rate monitoring method of claim 1 , wherein the emitting of the light from the light source further comprises measuring an intensity of the light irradiated from the light source.

5. The deposition rate monitoring method of claim 4 , further comprising normalizing a signal detected in the detecting of the amount of the light emitted from the deposition material which is excited by the irradiated light using a signal detected in the measuring of the intensity of the light irradiated from the light source.

6. The deposition rate monitoring method of claim 1 , wherein the detecting of the amount of the light emitted from the deposition material which is excited by the irradiated light further comprises detecting amounts of lights other than fluorescence among the lights emitted from the deposition material.

7. The deposition rate monitoring method of claim 6 , further comprising subtracting the lights other than the fluorescence among the lights emitted from the deposition material from the light emitted from the deposition material which is excited by the irradiated light.

8. The deposition rate monitoring method of claim 1 , further comprising heating a first optical system which irradiates the light emitted from the light source toward the deposition material discharged from the deposition source.

9. A method of manufacturing an organic light-emitting display apparatus using an organic layer deposition apparatus to form an organic layer on a substrate, the method comprising:
transferring, into a chamber, a moving unit on which the substrate is attached, by using a first transfer unit passing through the chamber;
forming the organic layer by depositing a deposition material discharged from an organic layer deposition assembly on the substrate while the substrate is moved relative to the organic layer deposition assembly with the organic layer deposition assembly in the chamber being spaced apart from the substrate; and
returning the moving unit separated from the substrate using a second transfer unit passing through the chamber,

wherein the forming of the organic layer comprises:
emitting light having a wavelength within a photoexcitation bandwidth of the deposition material from a light source;
irradiating the light emitted from the light source toward the deposition material discharged from a deposition source; and
detecting light emitted from the deposition material which is excited by the irradiated light,
wherein the light emitted from the light source is irradiated toward a nozzle of the deposition source from which the deposition material is discharged.

Assignees

• Samsung Display Co Ltd

Inventors

• Voronov Alexander
• Maslov Dmitry
• Han Gyoo-Wan

Classifications

• G01N21/6489 Primary

  Photoluminescence of semiconductors · CPC title

• C23C14/547

  using optical methods · CPC title

• C23C14/568

  Transferring the substrates through a series of coating stations (C23C14/562 takes precedence) · CPC title

• C23C14/24

  Vacuum evaporation · CPC title

• G06F11/0748

  in a remote unit communicating with a single-box computer node experiencing an error/fault (remote testing G06F11/2294) · CPC title