Wiring substrate and method for manufacturing the wiring substrate

US9336938B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9336938-B2
Application numberUS-201313857226-A
CountryUS
Kind codeB2
Filing dateApr 5, 2013
Priority dateApr 12, 2012
Publication dateMay 10, 2016
Grant dateMay 10, 2016

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A wiring substrate includes a first insulating layer, a first magnetic layer that is a first plating film formed on the first insulating layer, a flat coil formed on the first magnetic layer, and a second magnetic layer that is a second plating film formed on the flat coil.

First claim

Opening claim text (preview).

What is claimed is: 1. A wiring substrate comprising: a first insulating layer; a first magnetic layer that is a first plating film formed on the first insulating layer; a flat coil formed on the first magnetic layer, the flat coil including a coil part having one or more coils; a second magnetic layer that is a second plating film formed on the flat coil and an insulating part formed in a space between the one or more coils of the coil part from a plan view, the insulating part including a side surface covered by the flat coil, an upper surface of the insulating part being flush with an upper surface of the flat coil; wherein the insulating part is formed between the one or more coils except at a periphery of one end of the coil part and a portion of a periphery of another end of the coil part from the plan view, wherein the second magnetic layer is formed directly on top of the insulating part, wherein the flat coil is a third plating film. 2. The wiring substrate as claimed in claim 1 , further comprising: an insulating film formed between the flat coil and the first magnetic layer. 3. The wiring substrate as claimed in claim 1 , further comprising: a second insulating layer formed on the second magnetic layer; a first wiring part formed on the second insulating layer; and a first via that penetrates the second insulating layer and the second magnetic layer; wherein the flat coil has one end that is connected to the first wiring part by the first via. 4. The wiring substrate as claimed in claim 3 , further comprising: a second wiring part formed on the second insulating layer; and a second via that penetrates the second insulating layer; wherein the flat coil has another end that is connected to the second wiring part by the second via. 5. The wiring substrate as claimed in claim 3 , wherein the second magnetic layer includes an opening to which the first via is inserted. 6. The wiring substrate as claimed in claim 3 , further comprising an insulating film formed between the second magnetic layer and the second insulating layer. 7. The wiring substrate as claimed in claim 1 , further comprising: an insulating film formed between the first insulating layer and the first magnetic layer. 8. The wiring substrate as claimed in claim 1 , wherein the flat coil includes the coil part having a thickness of 10 μm-20 μm. 9. The wiring substrate as claimed in claim 1 , wherein the flat coil includes an upper surface, an outermost side surface, and an innermost side surface, wherein the second magnetic layer covers the upper surface, the outermost side surface, and the innermost side surface of the flat coil. 10. The wiring substrate as claimed in claim 1 , wherein each of the first and second magnetic layers includes a magnetic material formed of an alloy having ferrite combined with zinc, nickel, cobalt, beryllium, magnesium, calcium, strontium, barium, or manganese. 11. The wiring substrate as claimed in claim 1 , wherein the flat coil is a single coil. 12. The wiring substrate as claimed in claim 1 , wherein the flat coil has a rectangular cross section. 13. A wiring substrate comprising: a first insulating layer; a first magnetic layer that is a first plating film formed on the first insulating layer; a flat coil formed on the first magnetic layer, the flat coil including a coil part having one or more coils; a second magnetic layer that is a second plating film formed on the flat coil; a first insulating film formed between the flat coil and the first magnetic layer; and a second insulating layer formed on the second magnetic layer; a first wiring part formed on the second insulating layer; a first via that penetrates the second insulating layer and the second magnetic layer; a second insulating film formed between the second magnetic layer and the second insulating layer; and an insulating part formed in a space between the one or more coils of the coil part from a plan view, the insulating part including a side surface covered by the flat coil, an upper surface of the insulating part being flush with an upper surface of the flat coil; wherein the insulating part is formed between the one or more coils except at a periphery of one end of the coil part and a portion of a periphery of another end of the coil part from the plan view, wherein the second magnetic layer is formed directly on top of the insulating part, wherein the flat coil has one end that is connected to the first wiring part by the first via; wherein the flat coil is a third plating film. 14. The wiring substrate as claimed in claim 13 , further comprising: a third insulating film formed between the first insulating layer and the first magnetic layer. 15. The wiring substrate as claimed in claim 13 , wherein the flat coil includes the coil part having a thickness of 10 μm-20 μm. 16. The wiring substrate as claimed in claim 13 , wherein the flat coil includes an upper surface, an outermost side surface, and an innermost side surface, wherein the second magnetic layer covers the upper surface, the outermost side surface, and the innermost side surface of the flat coil. 17. The wiring substrate as claimed in claim 13 , wherein each of the first and second magnetic layers includes a magnetic material formed of an alloy having ferrite combined with zinc, nickel, cobalt, beryllium, magnesium, calcium, strontium, barium, or manganese. 18. The wiring substrate as claimed in claim 13 , wherein the flat coil is a single coil. 19. The wiring substrate as claimed in claim 13 , wherein the flat coil has a rectangular cross section. 20. A method for manufacturing a wiring substrate comprising the steps of: forming a first magnetic layer on a first insulating layer by a first plating process; forming a flat coil on the first magnetic layer, the flat coil including a coil part having one or more coils; forming an insulating part in a space between the one or more coils of the coil part from a plan view, the insulating part including a side surface covered by the flat coil, an upper surface of the insulating part being flush with an upper surface of the flat coil, and forming a second magnetic layer on the flat coil and on the insulating part by a second plating process; wherein the insulating part is formed between the one or more coils except at a periphery of one end of the coil part and a portion of a periphery of another end of the coil part from the plan view, wherein the second magnetic layer is formed directly on top of the insulating part, wherein the flat coil is a third plating film that is formed by a plating process. 21. The method as claimed in claim 20 , wherein the flat coil includes the coil part having a thickness of 10 μm-20 μm. 22. The method as claimed in claim 20 , wherein the flat coil includes an upper surface, an outermost side surface, and an innermost side surface, wherein the second magnetic layer covers the upper surface, the outermost side surface, and the innermost side surface of the flat coil. 23. The method as claimed in claim 20 , wherein each of the first and second magnetic layers includes a magnetic material formed of an alloy having ferrite combined with zinc, nickel, cobalt, beryllium, magnesium, calcium, strontium, barium, or manganese. 24. The method as claimed in claim 20 , wherein the flat coil is a single coil formed by the plating process.

Assignees

Inventors

Classifications

  • Printed circuit coils (apparatus or processes for manufacturing printed circuits in general H05K3/00) · CPC title

  • with a magnetic layer · CPC title

  • structurally combined with ferromagnetic material · CPC title

  • Printed inductances (printed coils for dynamo-electric machines H02K3/26; printed circuits H05K) · CPC title

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Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US9336938B2 cover?
A wiring substrate includes a first insulating layer, a first magnetic layer that is a first plating film formed on the first insulating layer, a flat coil formed on the first magnetic layer, and a second magnetic layer that is a second plating film formed on the flat coil.
Who is the assignee on this patent?
Shinko Electric Ind Co
What technology area does this patent fall under?
Primary CPC classification H01F17/0006. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue May 10 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).