Optical element mount for lithographic apparatus

Patent metadata

Field	Value
Publication number	US-9335641-B2
Application number	US-200913054869-A
Country	US
Kind code	B2
Filing date	Jul 16, 2009
Priority date	Jul 21, 2008
Publication date	May 10, 2016
Grant date	May 10, 2016

Abstract

A mount configured to mount an optical element in a module for a lithographic apparatus. The mount includes a plurality of resilient members constructed and arranged to circumferentially support the optical element. Each resilient member includes a plurality of resilient subsections that are configured to engage the optical element around a perimeter thereof. Each resilient subsection is configured to flex independent of another resilient subsection.

First claim

What is claimed is:

1. A mount configured to mount an optical element in a module for a lithographic apparatus, the mount comprising:
a plurality of resilient members constructed and arranged to circumferentially support and exert a force on a perimeter of the optical element and attend to local radial irregularities, inhomogeneous thermal expansion, and Hertzian contact stress distribution,
wherein each resilient member comprises a leaf spring having an elongated body having a length, a width and a thickness, the length being greater than the width and the thickness being less than the width, and a plurality of resilient subsections that are configured to engage the optical element around the perimeter thereof, each resilient subsection being configured to flex independent of another resilient subsection.

2. The mount according to claim 1 , wherein the resilient subsections are arranged to allow for displacement with respect to each other.

3. The mount according to claim 1 , wherein the resilient subsections are located at one end of the respective resilient member.

4. The mount according to claim 1 , wherein the optical element is a mirror and wherein the mirror is a collector mirror constructed and arranged to condition radiation generated by an extreme ultraviolet radiation source.

5. A module for a lithographic apparatus, the module comprising
a radiation source constructed and arranged to generate extreme ultraviolet radiation;
a collector constructed and arranged to condition the extreme ultraviolet radiation; and
a mount configured to mount an optical element in the collector, the mount comprising a plurality of resilient members constructed and arranged to circumferentially support and exert a force on a perimeter of the optical element and attend to local radial irregularities, inhomogeneous thermal expansion, and Hertzian contact stress distribution,
wherein each resilient member comprises a leaf spring having an elongated body having a length, a width and a thickness, the length being greater than the width and the thickness being less than the width, and a plurality of resilient subsections that are configured to engage the optical element around a perimeter thereof, each resilient subsection being configured to flex independent of another resilient subsection.

6. The module according to claim 5 , wherein the resilient subsections are arranged to allow for displacement with respect to each other.

7. The module according to claim 5 , wherein the resilient subsections are located at one end of the respective resilient member.

8. The module according to claim 5 , wherein the optical element is a mirror and wherein the mirror is a collector mirror constructed and arranged to condition radiation generated by an extreme ultraviolet radiation source.

9. A resilient member constructed and arranged to exert a force on a perimeter of an optical element of a module of a lithographic apparatus, the resilient member comprising a leaf spring having an elongated body having a length, a width and a thickness, the length being greater than the width and the thickness being less than the width, and a plurality of resilient subsections that are configured to engage the optical element around the perimeter thereof, attend to local radial irregularities, inhomogeneous thermal expansion, and Hertzian contact stress distribution, and flex independent of another resilient subsection.

10. The resilient member according to claim 9 , wherein the resilient subsections are arranged to allow for displacement with respect to each other.

11. The resilient member according to claim 9 , wherein the resilient subsections are located at one end of the resilient member.

12. The resilient member according to claim 9 , wherein the optical element is a mirror and wherein the mirror is a collector mirror constructed and arranged to condition radiation generated by an extreme ultraviolet radiation source.

Assignees

• Tegenbosch Henricus Gerardus
• Struycken Alexander Matthijs
• Kleijn Jacob
• Beerens Ruud Antonius Catharina Maria
• Vanderhallen Ivo
• Asml Netherlands Bv

Inventors

• Tegenbosch Henricus Gerardus
• Struycken Alexander Matthijs
• Kleijn Jacob
• Beerens Ruud Antonius Catharina Maria
• Vanderhallen Ivo

Classifications

• G03F7/70783

  Handling stress or warp of chucks, masks or workpieces, e.g. to compensate for imaging errors or considerations related to warpage of masks or workpieces due to their own weight · CPC title

• G03F7/70175

  Lamphouse reflector arrangements or collector mirrors, i.e. collecting light from solid angle upstream of the light source · CPC title

• G03F7/70891 Primary

  Temperature · CPC title

• G03F7/70825 Primary

  Mounting of individual elements, e.g. mounts, holders or supports (workpiece or mask holders G03F7/707) · CPC title