Method and system for cleaning a vacuum chamber

Patent metadata

Field	Value
Publication number	US-9327324-B2
Application number	US-201313777044-A
Country	US
Kind code	B2
Filing date	Feb 26, 2013
Priority date	Feb 26, 2013
Publication date	May 3, 2016
Grant date	May 3, 2016

Abstract

A system and method are described, for use in cleaning of a vacuum chamber. The method comprising connecting a vacuum chamber to a plasma generating unit via a plasma connection port and connecting the vacuum chamber to a high vacuum pumping unit via a pumping port. A flow conductance through the plasma connection port to the vacuum chamber is controlled to limit passage of charged particles and cleaning substances produced in the plasma generating unit, to thereby maintain a working pressure inside the vacuum chamber while cleaning the vacuum chamber by said cleaning substances.

First claim

The invention claimed is:

1. A method for use in cleaning of a vacuum chamber configured for operating at a micro-Torr pressure range, the method comprising:
connecting the vacuum chamber to a plasma generating unit via a plasma connection port and to a pumping unit via a pumping port, and
controlling a flow conductance for charged particles and cleaning substances produced in the plasma generating unit through the plasma connection port into the vacuum chamber, wherein said controlling comprises providing in said plasma connection port a barrier plate having at least one aperture and maintaining a working pressure at a micro-Torr range inside the vacuum chamber that is lower than a pressure in the plasma generating unit while cleaning the vacuum chamber by said cleaning substances, and said maintaining comprises selecting a dimension of the at least one aperture.

2. The method of claim 1 , wherein said controlling of the flow conductance for the charged particles and cleaning substances comprises determining a steady state pressure difference between the working pressure of the vacuum chamber and the pressure in the plasma generating unit.

3. The method of claim 2 , comprising selecting an electrically conductive material composition and electrical condition for said barrier plate to thereby substantially prevent propagation of the charged particles into the vacuum chamber.

4. The method of claim 2 , wherein the dimension of said aperture is between 1 to 3 millimeters.

5. The method of claim 1 , comprising continuously operating the vacuum chamber under said working pressure for performing one or more processes in the vacuum chamber, and operating the plasma generating unit and the pumping unit for cleaning said vacuum chamber by the cleaning substances flowing into the vacuum chamber from the plasma generating unit.

6. The method of claim 1 , comprising operating the pumping unit for evacuating said vacuum chamber at a certain pumping rate S, and selecting the flow conductance of the plasma connection port such that a ratio between said flow conductance and said pumping rate is substantially similar to a ratio between the working pressure in said vacuum chamber and the pressure in said plasma generating unit.

7. A system for cleaning a vacuum chamber configured for operating at a micro-Torr pressure range by carrying out the method of claim 1 , the system comprising:
a plasma generating unit connectable to the vacuum chamber via a plasma connection port; and
a pumping unit connected to the vacuum chamber via a pumping port, said plasma connection port comprising a barrier plate comprising at least one aperture having a preselected dimension for controlling a flow conductance through the plasma connection port to the vacuum chamber for charged particles and cleaning substances produced in the plasma generating unit, to thereby maintain a predetermined working pressure at a micro-Torr range inside the vacuum chamber while cleaning the vacuum chamber by said cleaning substances, wherein said barrier plate has one or more selected parameters such that said flow conductance provides a steady state of the working pressure in the vacuum chamber, and said one or more parameters comprise at least the dimension of the at least one aperture in the barrier plate to determine a flow rate for the cleaning substances into the vacuum chamber, and the dimension of said aperture is in a range of about 0.3-1 millimeters, the working pressure being in a micro-Torr range and the pressure in the plasma generating unit being at least in a mili-Torr range.

8. The system of claim 7 , wherein said barrier plate is made of a selected electrically conductive material composition and has a predetermined electrical condition to thereby substantially prevent propagation of the charged particles into the vacuum chamber.

9. The system of claim 7 , wherein said barrier plate is an electrically grounded metallic plate with the aperture therein.

10. The system of claim 7 , wherein said barrier plate is installed across the plasma connection port.

11. The method of claim 1 , wherein said selecting the dimension of the at least one aperture in the barrier plate comprises selecting an appropriate aperture diameter to allow a suitable pressure difference between the vacuum chamber and the plasma generating unit such that the output pressure of the plasma generating unit is adequate to sustain the working pressure in the vacuum chamber while being evacuated by the pumping unit.

Assignees

• Applied Materials Israel Ltd

Inventors

• Segev Lior
• Nir Irit Ruach
• Eitan Guy

Classifications

• B08B7/00 Primary

  Cleaning by methods not provided for in a single other subclass or a single group in this subclass · CPC title

• H01J37/02 Primary

  Details · CPC title

• H01J37/20

  Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support · CPC title

• B08B7/04

  by a combination of operations · CPC title

• H01J2237/022

  Avoiding or removing foreign or contaminating particles, debris or deposits on sample or tube · CPC title