On-chip terahertz thin-film devices
US-2024429627-A1 · Dec 26, 2024 · US
US9324674B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9324674-B2 |
| Application number | US-201414562129-A |
| Country | US |
| Kind code | B2 |
| Filing date | Dec 5, 2014 |
| Priority date | Dec 24, 2013 |
| Publication date | Apr 26, 2016 |
| Grant date | Apr 26, 2016 |
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Official abstract text for this publication.
A die comprising a body of semiconductor material, said body configured to receive a solder layer of gold containing alloy for use in die bonding said die to a substrate, wherein the die includes an interface layer on a surface of the body for receiving the solder layer, the interface layer having a plurality of sub-layers of different metals.
Opening claim text (preview).
The invention claimed is: 1. A package comprising a substrate of copper coupled to a die by a solder layer, the solder layer comprising an alloy of gold and tin, the die comprising: a body of semiconductor material, wherein the die includes an interface layer on a surface of the body, and the solder layer is affixed to the interface layer; the interface layer includes a plurality of sub-layers of different metals; the interface layer comprises a first sub-layer of gold applied to the body, a second sub-layer of silver, a third sub-layer of nickel and a fourth sub-layer of gold; and the second sub-layer of silver is thinner than the third sub-layer of nickel. 2. The package according to claim 1 , wherein the first sub-layer and fourth sub-layer are thicker than the second and third sub-layers. 3. The package according to claim 2 , wherein the solder layer is at least two times thicker than the interface layer. 4. The package according to claim 1 , wherein the substrate is substantially homogeneous. 5. The package according to claim 1 , wherein the substrate includes a pad layer of gold arranged between the substrate and the solder layer. 6. The package according to claim 1 , wherein the package comprises an RF power package. 7. A method of forming a package, comprising the steps of: receiving a substrate of copper; receiving a semiconductor body; applying an interface layer to the semiconductor body, the interface layer comprising a plurality of sub-layers of different metals, wherein the step of applying the interface layer comprises: applying a first sub-layer of gold to the semiconductor body, applying a second sub-layer of silver to the first sub-layer, applying a third sub-layer of nickel to the second sub-layer and applying a fourth sub-layer of gold to the third sub-layer; and wherein the second sub-layer of silver is thinner than the third sub-layer of nickel; and die bonding the semiconductor body with the interface layer to the substrate using a solder layer that comprises an alloy of gold and tin. 8. A method according to claim 7 , wherein the step of applying the interface layer comprises sputtering, evaporative plating or electroplating said layer. 9. The method according to claim 7 , wherein the substrate comprises a pad layer of gold thereon for receiving the solder layer.
between a chip and a stacked lead frame, conducting package substrate or heat sink · CPC title
relative to the surface, e.g. recessed, protruding · CPC title
changes in materials · CPC title
Soldering or alloying · CPC title
Ultrasonic bonding, e.g. thermosonic bonding · CPC title
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