Etching device and a method for etching a material of a workpiece

Patent metadata

Field	Value
Publication number	US-9318358-B2
Application number	US-201113095956-A
Country	US
Kind code	B2
Filing date	Apr 28, 2011
Priority date	Apr 28, 2011
Publication date	Apr 19, 2016
Grant date	Apr 19, 2016

Abstract

An etching device is provided, the etching device including a process chamber including an etchant, a structure configured to provide a laminar flow of the etchant, and a workpiece handler configured to move a workpiece through the laminar flow of the etchant along a predefined track.

First claim

What is claimed is:

1. An etching device, comprising:
a process chamber comprising an etchant;
a structure configured to provide a laminar flow of the etchant; and
a workpiece handler configured to hold and move a workpiece through the laminar flow of the etchant along a predefined track, wherein the workpiece handler is configured to hold the workpiece so that a side of the workpiece to be etched is substantially perpendicular to the laminar flow of the etchant, and so that the workpiece is fully immersed in the etchant.

2. The etching device of claim 1 ,
wherein the predefined track forms at least a part of a loop; and
wherein a center of the loop is located outside the workpiece.

3. The etching device of claim 1 ,
wherein the process chamber comprises a process tank configured to receive the etchant.

4. The etching device of claim 3 ,
wherein the etching device is configured to generate a flow of the etchant through the process tank.

5. The etching device of claim 4 , further comprising:
at least one pump connected to the process chamber to provide the flow of the etchant through the process tank.

6. The etching device of claim 1 ,
wherein the laminar flow of the etchant is configured to etch a side of the workpiece.

7. The etching device of claim 6 ,
wherein the etching device is configured such that the rate of laminar flow of the etchant to a side of the workpiece to be etched is greater than the rate of flow of the etchant, due to at least one of diffusion, convection and gravitation, to the side of the workpiece to be etched.

8. The etching device of claim 1 ,
wherein the structure comprises a plurality of channels guiding the etchant to thereby provide the laminar flow.

9. The etching device of claim 8 ,
wherein the channels are formed by an array of pipes being arranged in a predefined manner to provide the laminar flow.

10. The etching device of claim 8 ,
wherein the structure comprises a plate, the plate comprising a plurality of through-holes as the plurality of channels.

11. The etching device of claim 10 ,
wherein the plate is at least twice as large as the workpiece.

12. The etching device of claim 1 ,
wherein the workpiece handler is configured to move the workpiece through the laminar flow of the etchant without proper motion of the workpiece with respect to the workpiece handler.

13. The etching device of claim 12 ,
wherein the workpiece handler is configured to move the workpiece through the laminar flow of the etchant without proper rotation of the workpiece with respect to the workpiece handler.

14. The etching device of claim 1 ,
wherein a side of the workpiece to be etched is configured to be at fixed angle with respect to the direction of laminar flow of the etchant.

15. The etching device of claim 1 ,
wherein the workpiece is a wafer.

16. The etching device of claim 15 ,
wherein the wafer is a semiconductor wafer.

17. The etching device of claim 15 ,
wherein the workpiece is a solar cell.

18. The etching device of claim 15 ,
wherein the workpiece is a printed circuit board.

19. The etching device of claim 1 ,
wherein the workpiece comprises a structure to be etched.

20. The etching device of claim 19 ,
wherein the structure to be etched comprises a material which can be etched using a diffusion controlled etching process using the etchant.

21. The etching device of claim 20 ,
wherein the structure to be etched comprises a material selected from a group consisting of: copper, polysilicon, silicon and aluminum.

Assignees

• Fischer Thomas
• Foerg Raimund
• Bernrieder Sebastian
• Larisch Michael
• Infineon Technologies Ag

Inventors

• Fischer Thomas
• Foerg Raimund
• Bernrieder Sebastian
• Larisch Michael

Classifications

• H10P72/0422

  for wet etching · CPC title

• H10P72/0416

  with the semiconductor substrates being dipped in baths or vessels · CPC title

• H10P72/0411

  for wet cleaning or washing · CPC title

• H10P72/0402

  Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence) · CPC title

• H10P72/0426 Primary

  with the semiconductor substrates being dipped in baths or vessels · CPC title