Fabricating process of embedded circuit structure

US9307651B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9307651-B2
Application numberUS-201213421330-A
CountryUS
Kind codeB2
Filing dateMar 15, 2012
Priority dateJul 6, 2007
Publication dateApr 5, 2016
Grant dateApr 5, 2016

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A fabricating process for an embedded circuit structure is provided. A through hole is formed in a core panel and penetrates the core panel. Two indent patterns are respectively formed on two opposite surfaces of the core panel. A conductive material is electroplated into the through hole and the indent patterns, so as to form a conductive channel in the through hole and two circuit patterns in the indent patterns respectively. Portions of the circuit patterns, which exceed the indent patterns respectively, are removed for planarizing the circuit patterns to be level with the two surfaces of the core panel respectively.

First claim

Opening claim text (preview).

What is claimed is: 1. A fabricating process for an embedded circuit structure, comprising: providing a core panel; forming at least one through hole in the core panel, the through hole penetrating the entire thickness of the core panel; forming a first indent pattern on a first major surface of the core panel; forming a second indent pattern on a second major surface of the core panel, the second major surface being opposite to the first major surface of the core panel; electroplating a conductive material into the through hole, the first indent pattern and the second indent pattern, so as to form a conductive channel in the through hole, a first circuit pattern in the first indent pattern, and a second circuit pattern in the second indent pattern, wherein portions of the first circuit pattern exceed the first major surface, portions of the second circuit pattern exceed the second major surface, and the electroplating process includes performing a chemical electroplating process at first and then performing an electrolysis electroplating process; and removing the portions of the first circuit pattern, which exceed the first major surface, for planarizing the first circuit pattern to be level with the first major surface of the core panel, and removing the portions of the second circuit pattern, which exceed the second major surface, for planarizing the second circuit pattern to be level with the second major surface of the core panel. 2. The fabricating process for the embedded circuit structure according to claim 1 , wherein the step of forming the through hole includes a laser processing or a mechanical processing. 3. The fabricating process for the embedded circuit structure according to claim 1 , wherein the step of forming the first indent pattern and the second indent pattern includes a laser processing. 4. The fabricating process for the embedded circuit structure according to claim 1 , wherein the step of removing the portions of the first circuit pattern and the portions of the second circuit pattern includes etching or polishing. 5. The fabricating process for the embedded circuit structure according to claim 1 , wherein the conductive channel has a tubular space. 6. The fabricating process for the embedded circuit structure according to claim 5 , further comprising: filling the tubular space of the conductive channel with a stuffing material to form a stuffing pillar. 7. The fabricating process for the embedded circuit structure according to claim 6 , further comprising: removing portions of the stuffing pillar, which protrude from the first surface and the second surface, for planarizing two ends of the stuffing pillar to be level with the first surface and the second surface of the core panel respectively.

Assignees

Inventors

Classifications

  • recessed into the surface of the package substrates, interposers, or redistribution layers · CPC title

  • by making a conductive layer having a relief pattern, followed by abrading of the raised portions · CPC title

  • Manufacturing circuit on or in base · CPC title

  • H05K3/107Primary

    by filling grooves in the support with conductive material (H05K3/045, H05K3/101, H05K3/1258 and H05K3/465 take precedence) · CPC title

  • Recesses or grooves in insulating substrate · CPC title

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What does patent US9307651B2 cover?
A fabricating process for an embedded circuit structure is provided. A through hole is formed in a core panel and penetrates the core panel. Two indent patterns are respectively formed on two opposite surfaces of the core panel. A conductive material is electroplated into the through hole and the indent patterns, so as to form a conductive channel in the through hole and two circuit patterns in…
Who is the assignee on this patent?
Chen Tsung-Yuan, Chiang Shu-Sheng, Unimicron Technology Corp
What technology area does this patent fall under?
Primary CPC classification H05K3/107. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Apr 05 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).