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US-2024210821-A1 · Jun 27, 2024 · US
Resist composition and method for producing semiconductor device
US9304399B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9304399-B2 |
| Application number | US-201414279795-A |
| Country | US |
| Kind code | B2 |
| Filing date | May 16, 2014 |
| Priority date | Sep 28, 2010 |
| Publication date | Apr 5, 2016 |
| Grant date | Apr 5, 2016 |
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Abstract
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A resist composition includes: a crosslinking material that is crosslinked in the presence of an acid; an acid amplifier; and a solvent.
First claim
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What is claimed is: 1. A method for producing a semiconductor device, comprising: forming a first resist pattern capable of supplying an acid, with a first resist composition, on a semiconductor substrate; forming a second resist layer by coating a second resist composition containing a crosslinking material that is crosslinked in the presence of an acid, an acid amplifier, an inclusion compound, and a solvent, on the first resist pattern, wherein the inclusion compound includ…
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Electricity · mapped topic
Physics · mapped topic
Physics · mapped topic
Physics · mapped topic
Physics · mapped topic
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Frequently asked questions
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- What does patent US9304399B2 cover?
- A resist composition includes: a crosslinking material that is crosslinked in the presence of an acid; an acid amplifier; and a solvent.
- Who is the assignee on this patent?
- Sony Corp
- What technology area does this patent fall under?
- Primary CPC classification G03F7/40. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Apr 05 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).