Low noise, high stability, deep ultra-violet, continuous wave laser

Patent metadata

Field	Value
Publication number	US-9293882-B2
Application number	US-201314080746-A
Country	US
Kind code	B2
Filing date	Nov 14, 2013
Priority date	Sep 10, 2013
Publication date	Mar 22, 2016
Grant date	Mar 22, 2016

Abstract

A laser for generating deep ultra-violet (DUV) continuous wave (CW) light includes a second-harmonic generator and a fourth-harmonic generator. The fourth-harmonic generator includes a plurality of mirrors as well as first and second non-linear optical (NLO) crystals. The first NLO crystal generates the light having the fourth harmonic wavelength, and is placed in operative relation to the plurality of mirrors. The second NLO crystal is placed in operative relation to the first NLO crystal such that the light having the second harmonic wavelength passes through both the first and the second NLO crystals. Notably, the second optical axes of the second NLO crystal are rotated about a direction of propagation of the light within the second NLO crystal approximately 90 degrees relative to the first optical axes of the first NLO crystal. The second NLO crystal provides no wavelength conversion.

First claim

The invention claimed is:

1. A laser for generating deep ultra-violet (DUV) continuous wave (CW) light, the laser comprising:
a second-harmonic generator for converting light having a fundamental wavelength to light having a second harmonic wavelength; and
a fourth-harmonic generator for converting the light having the second harmonic wavelength to light having a fourth harmonic wavelength, the fourth-harmonic generator including:
a plurality of mirrors configured to circulate light in the fourth harmonic generator;
a first non-linear optical (NLO) crystal having first optical axes that are oriented relative to the light circulated in the fourth harmonic generator such that said first NLO crystal converts a portion of the light having the second harmonic wavelength to light having the fourth harmonic wavelength and having a first astigmatism, the first NLO crystal in operative relation to the plurality of mirrors such that the light circulating in the fourth harmonic generator is directed into the first NLO crystal only in a single light propagation direction; and
a second NLO crystal in operative relation to the first NLO crystal such that all of the light having the second harmonic wavelength passes through the first NLO crystal and at least a portion of the light having the second harmonic wavelength passes through the second NLO crystal only in said single light propagation direction,
wherein the second optical axes of the second NLO crystal are rotated approximately 90 degrees relative to said first optical axes of the first NLO crystal and said second NLO crystal is configured such that a second astigmatism created by the light having the second harmonic wavelength within the second NLO crystal reduces said first astigmatism, and such that none of the light having the second harmonic wavelength that passes through the second NLO crystal is converted by said second NLO crystal to light having the fourth harmonic wavelength.

2. The laser of claim 1 , wherein each of the first NLO crystal and the second NLO crystal is hydrogen-annealed.

3. The laser of claim 1 , wherein each of the first NLO crystal and the second NLO crystal comprises a hydrogen-annealed CLBO (cesium lithium borate) crystal.

4. The laser of claim 1 , wherein the light having the second harmonic is focused to a substantially elliptical beam waist in, or proximate to, the first NLO crystal, with a long axis of an ellipse substantially parallel to a first e-axis.

5. The laser of claim 1 , wherein the first NLO crystal and the second NLO crystal are controlled in temperature to reduce said first astigmatism created in the first NLO crystal by a focused beam therein.

6. The laser of claim 1 , wherein at least the first NLO crystal is controlled in temperature to reduce said first astigmatism created in the first NLO crystal by a focused beam therein.

7. The laser of claim 6 , wherein a controlled temperature is approximately 50° C. or lower.

8. The laser of claim 1 , the fourth harmonic generator further including a pair of thin plates with parallel surfaces, the pair of thin plates being tilted at substantially equal and opposite angles so as to minimize any displacement of a light beam while compensating for astigmatism.

9. The laser of claim 1 , the fourth harmonic generator further including a feedback control loop that automatically adjusts an astigmatism compensation so as to substantially cancel said first astigmatism introduced by the first NLO crystal.

10. A system for inspecting a wafer, reticle, or photomask, the system comprising:
a deep ultra-violet (DUV) continuous wave (CW) laser including:
a second harmonic generator for converting light having a fundamental wavelength to light having a second harmonic wavelength; and
a fourth harmonic generator for converting the light having the second harmonic wavelength to light having a fourth harmonic wavelength, the fourth harmonic generator including:
a plurality of mirrors configured to circulate light in the fourth harmonic generator;
a first non-linear optical (NLO) crystal configured to generate the light having the fourth harmonic wavelength and having a first astigmatism by converting a converted portion of the light having the second harmonic wavelength, the first NLO crystal in operative relation to the plurality of mirrors such that the light circulating in the fourth harmonic generator is directed into the first NLO crystal only in a single light propagation direction; and
a second NLO crystal in operative relation to the first NLO crystal such that all of the light having the second harmonic wavelength passes through the first NLO crystal, an uncoverted portion of the light having the second harmonic wavelength passes from the first NLO crystal and through the second NLO crystal only in said single light propagation direction, and said light having the fourth harmonic wavelength generated by the first NLO crystal passes through the second NLO crystal only in said single light propagation direction,
wherein the second optical axes of the second NLO crystal are rotated approximately 90 degrees relative to first optical axes of the first NLO crystal, and said second NLO crystal is configured such that a second astigmatism created by the light having the second harmonic wavelength within the second NLO crystal reduces said first astigmatism, and such that none of the unconverted portion of the light having the second harmonic wavelength is converted to light having the fourth harmonic wavelength by said second NLO crystal.

11. The system of claim 10 , wherein each of the first NLO crystal and the second NLO crystal is hydrogen-annealed.

12. The system of claim 10 , wherein each of the first NLO crystal and the second NLO crystal comprises a hydrogen-annealed CLBO (cesium lithium borate) crystal.

13. The system of claim 10 , wherein light having the second harmonic is focused to a substantially elliptical beam waist in, or proximate to, the first NLO crystal, with a long axis of an ellipse substantially parallel to a first e-axis.

14. The system of claim 10 , wherein the first NLO crystal and the second NLO crystal are controlled in temperature to reduce said first astigmatism created in the first NLO crystal by a focused beam therein.

15. The system of claim 10 , wherein at least the first NLO crystal is controlled in temperature to reduce said first astigmatism created in the first NLO crystal by a focused beam therein.

16. The system of claim 15 , wherein a controlled temperature is approximately 50° C. or lower.

17. The system of claim 10 , the fourth harmonic generator further including a pair of thin plates with parallel surfaces, the pair of thin plates being tilted at substantially equal and opposite angles so as to minimize any displacement of a light beam while compensating for astigmatism.

18. The system of claim 10 , the fourth harmonic generator further including a feedback control loop that automatically adjusts an astigmatism compensation so as to substantially cancel said first astigmatism introduced by the first NLO crystal.

19. A method of generating deep ultra-violet (DUV) continuous wave (CW) light in a laser, the method including:
converting light having a fundamental wavelength to light having a second harmonic wavelength;
converting a portion of the light having the second harmonic wavelength to light having a fourth harmonic wavelength by circulating the light having the second harmonic wavelength in a cavity configured such that said light passes through a first non-linear optical

Assignees

• Kla Tencor Corp

Inventors

• Chuang Yung-Ho

Classifications

• H01S3/0085

  Modulating the output, i.e. the laser beam is modulated outside the laser cavity · CPC title

• H01S3/0092 Primary

  Nonlinear frequency conversion, e.g. second harmonic generation [SHG] or sum- or difference-frequency generation outside the laser cavity (nonlinear frequency conversion per se G02F1/35) · CPC title

• G01N21/33

  using ultraviolet light (G01N21/39 takes precedence) · CPC title

• G02F1/37

  for second-harmonic generation {(G02F1/3532 takes precedence)} · CPC title

• G01N21/9501

  Semiconductor wafers (manufacturing processes per se of semiconductor devices implementing a measuring step H10P74/20) · CPC title