System and methods for plasma application

Patent metadata

Field	Value
Publication number	US-9287091-B2
Application number	US-201514669028-A
Country	US
Kind code	B2
Filing date	Mar 26, 2015
Priority date	May 30, 2008
Publication date	Mar 15, 2016
Grant date	Mar 15, 2016

Abstract

A plasma system includes a plasma device, an ionizable media source, and a power source. The plasma device includes an inner electrode and an outer electrode coaxially disposed around the inner electrode. The inner electrode includes a distal portion and an insulative layer that covers at least a portion of the inner electrode. The ionizable media source is coupled to the plasma device and is configured to supply ionizable media thereto. The power source is coupled to the inner and outer electrodes, and is configured to ignite the ionizable media at the plasma device to form a plasma effluent having an electron sheath layer about the exposed distal portion.

First claim

What is claimed is:

1. A plasma system, comprising:
a plasma device including:
an outer electrode having an inner surface and a first coating including a first type of material, the first coating disposed on at least a portion of the inner surface; and
an inner electrode disposed within the outer electrode and having an outer surface and a second coating including a second type of material different from the first type of material, the second coating disposed on at least a portion of the outer surface;

an ionizable media source coupled to the plasma device and configured to supply ionizable media thereto; and
a power source coupled to the inner electrode and the outer electrode and configured to ignite the ionizable media to form a plasma effluent having an electron sheath layer about a distal end portion of the inner electrode.

2. The plasma system according to claim 1 , wherein the first type of material is a catalyst, and the second type of material is configured to promote increased secondary electron emission.

3. The plasma system according to claim 1 , wherein the plasma device defines an opening between the outer surface of the inner electrode and the inner surface of the outer electrode.

4. The plasma system according to claim 1 , wherein the inner electrode and the outer electrode are formed from an alloy, and the first type of material and the second type of material include at least one of an oxide or a nitride of the alloy of the inner electrode or the outer electrode.

5. The plasma system according to claim 4 , further comprising a precursor source coupled to the plasma device and configured to provide at least one of an oxygen or a nitrogen to the plasma device to replenish at least one of the first type of material or the second type of material.

6. The plasma system according to claim 1 , wherein at least one of the first coating or the second coating includes a plurality of nanostructure pores.

7. The plasma system according to claim 6 , wherein at least a portion of the plurality of nanostructure pores includes precursor feedstock disposed therein.

8. The plasma system according to claim 1 , wherein the inner surface of the outer electrode defines a plurality of grooves therein, the plurality of grooves having the first coating disposed therein.

9. The plasma system according to claim 1 , wherein the distal end portion of the inner electrode extends distally past a distal end of the outer electrode, the second coating covering the inner electrode up to the distal end portion of the inner electrode such that the distal end portion of the inner electrode is un-insulated.

10. The plasma system according to claim 1 , wherein the plasma device further includes an electrode spacer slidably disposed between the inner electrode and the outer electrode.

11. A plasma device configured to receive ionizable media, comprising:
an outer electrode having an inner surface and a first coating including a first type of material, the first coating disposed on at least a portion of the inner surface; and
an inner electrode disposed within the outer electrode and having an outer surface and a second coating including a second type of material different from the first type of material, the second coating disposed on at least a portion of the outer surface.

12. The plasma device according to claim 11 , wherein the first type of material is a catalyst, and the second type of material is configured to promote increased secondary electron emission.

13. The plasma device according to claim 11 , wherein an opening is defined between the outer surface of the inner electrode and the inner surface of the outer electrode.

14. The plasma device according to claim 11 , wherein the inner electrode and the outer electrode are formed from an alloy, and the first type of material and the second type of material are formed from at least one of an oxide or a nitride of the alloy of the inner electrode or the outer electrode.

15. The plasma device according to claim 11 , wherein at least one of the first coating or the second coating includes a plurality of nanostructure pores.

16. The plasma device according to claim 15 , wherein the plurality of nanostructure pores includes precursor feedstock disposed therein.

17. The plasma device according to claim 11 , wherein the inner surface of the outer electrode defines a plurality of grooves therein, the plurality of grooves having the first coating disposed therein.

18. The plasma device according to claim 11 , wherein the inner electrode includes a distal end portion extending distally past a distal end of the outer electrode, the second coating covering the inner electrode up to the distal end portion of the inner electrode such that the distal end portion of the inner electrode is un-insulated.

Assignees

• Univ Colorado State Res Found

Inventors

• Koo Il-Gyo
• Moore Cameron A
• Collins George J
• Cho Jin-Hoon

Classifications

• H05H1/2441

  characterised by the physical-chemical properties of the dielectric, e.g. porous dielectric · CPC title

• H05H2245/32

  Surgery, e.g. scalpels, blades or bistoury; Treatments inside the body · CPC title

• H01J37/32366 Primary

  Localised processing · CPC title

• H01J37/32449

  Gas control, e.g. control of the gas flow · CPC title

• H01J37/32559

  Protection means, e.g. coatings · CPC title