Light modulator and illumination system of a microlithographic projection exposure apparatus

Patent metadata

Field	Value
Publication number	US-9274434-B2
Application number	US-201414249730-A
Country	US
Kind code	B2
Filing date	Apr 10, 2014
Priority date	Nov 15, 2011
Publication date	Mar 1, 2016
Grant date	Mar 1, 2016

Abstract

An illumination system of a microlithographic projection exposure apparatus comprises a light modulator which includes a modulator substrate and an array of mirrors that are supported by the modulator substrate. At least some adjacent mirrors partly overlap. The light modulator further comprises a plurality of actuators that are supported by the modulator substrate and are configured to tilt the mirrors individually.

First claim

The invention claimed is:

1. A light modulator, comprising:
a substrate;
an array of mirrors comprising a first mirror and a second mirror, each mirror in the array of mirrors comprising a reflective surface with a shape; and
a plurality of actuators supported by the substrate,
wherein:
the plurality of actuators are configured to tilt the mirrors individually about two tilt axes;
for each mirror in the array of mirrors, the shape of the reflective surface is the same as the shape of the reflective surface of each of the other mirrors in the array of mirrors;
for each mirror in the array of mirrors, the shape of the reflective surface of the mirror has an orientation with respect to an axis which is substantially orthogonal to each of the two tilt axes; and
the orientation of the shape of the reflective surface of the first mirror is different from the orientation of the shape of the reflective surface of the second mirror.

2. The light modulator of claim 1 , wherein at least some edges of the reflective surfaces of the mirrors in the array of mirrors are irregularly shaped.

3. The light modulator of claim 1 , wherein the orientations of the shapes of the reflective surfaces of the mirrors in the array of mirrors are pseudo-randomly distributed within a range of rotational angles.

4. The light modulator of claim 3 , wherein at least some edges of the reflective surfaces of the mirrors in the array of mirrors are irregularly shaped.

5. The light modulator of claim 3 , wherein the range is between 0.1° and 30°.

6. The light modulator of claim 5 , wherein at least some edges of the reflective surfaces of the mirrors in the array of mirrors are irregularly shaped.

7. The light modulator of claim 3 , wherein the range is between 1° and 5°.

8. The light modulator of claim 7 , wherein at least some edges of the reflective surfaces of the mirrors in the array of mirrors are irregularly shaped.

9. The light modulator of claim 1 , wherein the at least some of the mirrors in the array of mirrors are non-rotatable.

10. An illumination system, comprising
a light modulator according to claim 1 ,
wherein the illumination system is a microlithographic illumination system.

11. An apparatus, comprising:
an illumination system which comprises a light modulator according to claim 1 , the illumination system being configured to illuminate an object in an object field; and
a projection objective configured to image at least a portion of the object into an image field,
wherein the apparatus is a microlithographic projection exposure apparatus.

12. A method of using a microlithographic projection exposure apparatus which comprises an illumination system and a projection objective, the method comprising:
using the illumination system to illuminate an object in an object field; and
using the projection objective to project at least a portion of the object into an image field,
wherein the illumination system comprises a light modulator according to claim 1 .

13. A light modulator, comprising:
a substrate;
an array of mirrors comprising a first mirror and a second mirror, each mirror in the array of mirrors comprising a reflective surface having a shape; and
a plurality of actuators supported by the substrate,
wherein:
each mirror has at least two corresponding actuators configured to tilt the mirror individually about two tilt axes;
for each mirror in the array of mirrors, the shape of the reflective surface is the same as the shape of the reflective surface of each of the other mirrors in the array of mirrors;
for each mirror in the array of mirrors, the shape of the reflective surface of the mirror has an orientation with respect to an axis which is substantially orthogonal to each of the two tilt axes; and
the orientation of the shape of the reflective surface of the first mirror is different from the orientation of the shape of the reflective surface of the second mirror.

14. The light modulator of claim 13 , wherein at least some edges of the reflective surfaces of the mirrors in the array of mirrors are irregularly shaped.

15. The light modulator of claim 14 , wherein the orientations of the shapes of the reflective surfaces of the mirrors in the array of mirrors are pseudo-randomly distributed within a range of rotational angles.

16. The light modulator of claim 13 , wherein the orientations of the shapes of the reflective surfaces of the mirrors in the array of mirrors are pseudo-randomly distributed within a range of rotational angles.

17. The light modulator of claim 13 , wherein the at least some of the mirrors in the array of mirrors are non-rotatable.

18. An illumination system, comprising
a light modulator according to claim 13 ,
wherein the illumination system is a microlithographic illumination system.

19. An apparatus, comprising:
an illumination system which comprises a light modulator according to claim 13 , the illumination system being configured to illuminate an object in an object field; and
a projection objective configured to image at least a portion of the object into an image field,
wherein the apparatus is a microlithographic projection exposure apparatus.

20. A method of using a microlithographic projection exposure apparatus which comprises an illumination system and a projection objective, the method comprising:
using the illumination system to illuminate an object in an object field; and
using the projection objective to project at least a portion of the object into an image field,
wherein the illumination system comprises a light modulator according to claim 13 .

Assignees

• Zeiss Carl Smt Gmbh

Inventors

• Werber Armin
• Waldis Severin
• Bach Florian

Classifications

• G03F7/70191 Primary

  Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like · CPC title

• G02B26/0841

  the reflecting element being moved or deformed by electrostatic means · CPC title

• G03F7/70058 Primary

  Mask illumination systems · CPC title

• G02B26/0833

  the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD (G02B26/0825 takes precedence; micromechanical devices in general B81B) · CPC title

• G03F7/70116

  Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets · CPC title