Semiconductor die, semiconductor package and substrate dicing method
US-2024421000-A1 · Dec 19, 2024 · US
US9263334B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9263334-B2 |
| Application number | US-201214351975-A |
| Country | US |
| Kind code | B2 |
| Filing date | Sep 27, 2012 |
| Priority date | Oct 28, 2011 |
| Publication date | Feb 16, 2016 |
| Grant date | Feb 16, 2016 |
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Official abstract text for this publication.
A method of severing a semiconductor device composite includes a carrier having a main surface and a semiconductor layer sequence arranged on the main surface including forming a separating trench in the semiconductor device composite by a first laser cut such that the separating trench only partially severs the semiconductor device composite in a vertical direction running perpendicular to the main surface, and severing the semiconductor device composite completely along the separating trench with a severing cut with a laser.
Opening claim text (preview).
The invention claimed is: 1. A method of severing a semiconductor device composite which comprises a carrier having a main surface and a semiconductor layer sequence arranged on the main surface comprising: forming a separating trench in the semiconductor device composite by a first laser cut such that the separating trench only partially severs the semiconductor device composite in a vertical direction running perpendicular to the main surface; applying a second laser cut that only partially severs the carrier along the separating trench; applying a third laser cut that only partially severs the carrier along the separating trench; and severing the semiconductor device composite completely along the separating trench with a severing cut with a laser. 2. The method according to claim 1 , wherein the semiconductor device composite has a metal layer arranged on a side of the carrier remote from the semiconductor layer sequence. 3. The method according to claim 2 , wherein a bottom surface of the separating trench is arranged in the vertical direction between the metal layer and the main surface prior to the severing cut. 4. The method according to claim 1 , wherein the semiconductor layer sequence is fixed to the carrier by a bonding layer and the first laser cut severs the bonding layer completely. 5. The method according to claim 1 , wherein the first laser cut reaches into the carrier. 6. The method according to claim 1 , wherein the semiconductor layer sequence is structured into device regions prior to the first laser cut. 7. The method according to claim 6 , wherein the separating trench runs between adjacent device regions. 8. The method according to claim 1 , wherein the semiconductor layer sequence is deposited epitaxially on a growth substrate and the growth substrate is removed. 9. The method according to claim 6 , wherein the semiconductor layer sequence is deposited epitaxially on a growth substrate and the growth substrate is removed, and the device regions are formed after the growth substrate has been removed. 10. The method according to claim 1 , wherein the carrier is based on a semiconductor material. 11. The method according to claim 1 , wherein the carrier has a thickness of at most 200 μm. 12. The method according to claim 1 , wherein the semiconductor layer sequence is fixed to the carrier by a bonding layer; the first laser cut reaches into the carrier; the semiconductor device composite has a metal layer arranged on a side of the carrier remote from the semiconductor layer sequence; and a bottom surface of the separating trench is arranged in the vertical direction between the metal layer and the main surface prior to the severing cut.
used during dicing or grinding · CPC title
using temporarily an auxiliary support · CPC title
Grinding, lapping or polishing of wafers, substrates or parts of devices · CPC title
Cutting or separating of wafers, substrates or parts of devices · CPC title
for making a groove or trench, e.g. for scribing a break initiation groove · CPC title
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