Method of severing a semiconductor device composite

US9263334B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9263334-B2
Application numberUS-201214351975-A
CountryUS
Kind codeB2
Filing dateSep 27, 2012
Priority dateOct 28, 2011
Publication dateFeb 16, 2016
Grant dateFeb 16, 2016

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A method of severing a semiconductor device composite includes a carrier having a main surface and a semiconductor layer sequence arranged on the main surface including forming a separating trench in the semiconductor device composite by a first laser cut such that the separating trench only partially severs the semiconductor device composite in a vertical direction running perpendicular to the main surface, and severing the semiconductor device composite completely along the separating trench with a severing cut with a laser.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method of severing a semiconductor device composite which comprises a carrier having a main surface and a semiconductor layer sequence arranged on the main surface comprising: forming a separating trench in the semiconductor device composite by a first laser cut such that the separating trench only partially severs the semiconductor device composite in a vertical direction running perpendicular to the main surface; applying a second laser cut that only partially severs the carrier along the separating trench; applying a third laser cut that only partially severs the carrier along the separating trench; and severing the semiconductor device composite completely along the separating trench with a severing cut with a laser. 2. The method according to claim 1 , wherein the semiconductor device composite has a metal layer arranged on a side of the carrier remote from the semiconductor layer sequence. 3. The method according to claim 2 , wherein a bottom surface of the separating trench is arranged in the vertical direction between the metal layer and the main surface prior to the severing cut. 4. The method according to claim 1 , wherein the semiconductor layer sequence is fixed to the carrier by a bonding layer and the first laser cut severs the bonding layer completely. 5. The method according to claim 1 , wherein the first laser cut reaches into the carrier. 6. The method according to claim 1 , wherein the semiconductor layer sequence is structured into device regions prior to the first laser cut. 7. The method according to claim 6 , wherein the separating trench runs between adjacent device regions. 8. The method according to claim 1 , wherein the semiconductor layer sequence is deposited epitaxially on a growth substrate and the growth substrate is removed. 9. The method according to claim 6 , wherein the semiconductor layer sequence is deposited epitaxially on a growth substrate and the growth substrate is removed, and the device regions are formed after the growth substrate has been removed. 10. The method according to claim 1 , wherein the carrier is based on a semiconductor material. 11. The method according to claim 1 , wherein the carrier has a thickness of at most 200 μm. 12. The method according to claim 1 , wherein the semiconductor layer sequence is fixed to the carrier by a bonding layer; the first laser cut reaches into the carrier; the semiconductor device composite has a metal layer arranged on a side of the carrier remote from the semiconductor layer sequence; and a bottom surface of the separating trench is arranged in the vertical direction between the metal layer and the main surface prior to the severing cut.

Assignees

Inventors

Classifications

  • used during dicing or grinding · CPC title

  • using temporarily an auxiliary support · CPC title

  • Grinding, lapping or polishing of wafers, substrates or parts of devices · CPC title

  • H10P54/00Primary

    Cutting or separating of wafers, substrates or parts of devices · CPC title

  • for making a groove or trench, e.g. for scribing a break initiation groove · CPC title

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What does patent US9263334B2 cover?
A method of severing a semiconductor device composite includes a carrier having a main surface and a semiconductor layer sequence arranged on the main surface including forming a separating trench in the semiconductor device composite by a first laser cut such that the separating trench only partially severs the semiconductor device composite in a vertical direction running perpendicular to the…
Who is the assignee on this patent?
Osram Opto Semiconductors Gmbh
What technology area does this patent fall under?
Primary CPC classification H10P54/00. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Feb 16 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).