Salt and photoresist composition comprising the same

Patent metadata

Field	Value
Publication number	US-9260407-B2
Application number	US-201113295943-A
Country	US
Kind code	B2
Filing date	Nov 14, 2011
Priority date	Nov 15, 2010
Publication date	Feb 16, 2016
Grant date	Feb 16, 2016

Abstract

The present invention provides a salt represented by the formula (I):

wherein R 1 , R 2 , L 1 , Y, R 3 , R 4 , R 5 , R 6 , R 7 , n, s, and R 8 represent variables outlined in the specification.

First claim

What is claimed is:

1. A salt represented by the formula (I):

wherein R 1 and R 2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, L 1 represents a single bond, a C1-C6 alkanediyl group, a C4-C8 divalent alicyclic hydrocarbon group, —(CH 2 ) t —CO—O—* or —(CH 2 ) t —CO—O—CH 2 —(CH 2 ) u —*, one or more —CH 2 — in the alkanediyl group and —(CH 2 ) u — can be replaced by —O—, t represents an integer of 1 to 12, u represents an integer of 0 to 12, * represents a binding position to Y, Y represents a C3-C18 monovalent alicyclic hydrocarbon group which can have one or more substituents, one or more of —CH 2 — groups in the monovalent alicyclic hydrocarbon group can be replaced by —O—, —CO— or —SO 2 —, R 3 , R 4 , R 5 , R 6 and R 7 each independently represent a hydrogen atom, a hydroxyl group, a C1-C6 alkyl group, a C1-C6 alkoxy group, a C2-C7 alkoxycarbonyl group or a C2-C12 acyloxy group, and one or more of —CH 2 — groups in the alicycle containing S + have been replaced by —O— or —CO—, n represents an integer of 1 to 3, s represents an integer of 0 to 3, and R 8 is independently in each occurrence a C1-C6 alkyl group.

2. The salt according to claim 1 , wherein L 1 is a single bond or a methylene group.

3. An acid generator comprising the salt according to claim 1 .

4. A photoresist composition comprising the acid generator according to claim 3 and a resin having an acid-labile group, being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid.

5. The photoresist composition according to claim 4 , which further comprises a basic compound.

6. A process for producing a photoresist pattern comprising the following steps (1) to (5):
(1) a step of applying the photoresist composition according to claim 4 on a substrate,
(2) a step of forming a photoresist film by conducting drying,
(3) a step of exposing the photoresist film to radiation,
(4) a step of baking the exposed photoresist film, and
(5) a step of developing the baked photoresist film with an alkaline developer, thereby forming a photoresist pattern.

7. An acid generator comprising the salt according to claim 2 .

8. A process for producing a photoresist pattern comprising the following steps (1) to (5):
(1) a step of applying the photoresist composition according to claim 5 on a substrate,
(2) a step of forming a photoresist film by conducting drying,
(3) a step of exposing the photoresist film to radiation,
(4) a step of baking the exposed photoresist film, and
(5) a step of developing the baked photoresist film with an alkaline developer, thereby forming a photoresist pattern.

Assignees

• Anryu Yukako
• Ichikawa Koji
• Sumitomo Chemical Co

Inventors

• Anryu Yukako
• Ichikawa Koji

Classifications

• C07D327/06

  Six-membered rings · CPC title

• G03F7/0397

  the macromolecular compound having an alicyclic moiety in a side chain · CPC title

• C07C309/12

  containing esterified hydroxy groups bound to the carbon skeleton · CPC title

• G03F7/38

  Treatment before imagewise removal, e.g. prebaking {(G03F7/265 takes precedence)} · CPC title

• G03F7/0392

  the macromolecular compound being present in a chemically amplified positive photoresist composition · CPC title