Block copolymer, method of forming the same, and method of forming pattern

Patent metadata

Field	Value
Publication number	US-9255170-B2
Application number	US-201314086182-A
Country	US
Kind code	B2
Filing date	Nov 21, 2013
Priority date	Jan 11, 2013
Publication date	Feb 9, 2016
Grant date	Feb 9, 2016

Abstract

A block copolymer is provided. The block copolymer according to an exemplary embodiment includes a first block represented by Chemical Formula 1 and a second block represented by Chemical Formula 2:

wherein COM1 and COM2 are independently selected from a polystyrene moiety, polymethylmethacrylate moiety, polyethylene oxide moiety, polyvinylpyridine moiety, polydimethylsiloxane moiety, polyferrocenyldimethylsilane moiety, and polyisoprene moiety, R1 is hydrogen or an alkyl group with 1 to 10 carbon atoms, Ph is a phenyl group, a is 1 to 50, R2 is hydrogen or an alkyl group with 1 to 10 carbon atoms, and b is 1 to 50.

First claim

What is claimed is:

1. A block copolymer comprising:
a first block represented by Chemical Formula 1; and
a second block represented by Chemical Formula 2:

wherein COM1 and COM2 are independently selected from a polystyrene moiety, polymethylmethacrylate moiety, polyethylene oxide moiety, polyvinylpyridine moiety, polydimethylsiloxane moiety, polyferrocenyldimethylsilane moiety, and polyisoprene moiety, R1 is hydrogen or an alkyl group with 1 to 10 carbon atoms, Ph is a phenyl group, a is 1 to 50, R2 is hydrogen or an alkyl group with 1 to 10 carbon atoms, and b is 1 to 50.

2. The block copolymer of claim 1 , wherein
the block copolymer comprises a block represented by Chemical Formula BC comprising a first block represented by Chemical Formula 1 and a second block represented by Chemical Formula 2:

wherein COM1 and COM2 are independently selected from a polystyrene moiety, polymethylmethacrylate moiety, polyethylene oxide moiety, polyvinylpyridine moiety, polydimethylsiloxane moiety, polyferrocenyldimethylsilane moiety, and polyisoprene moiety, R1 is hydrogen or an alkyl group with 1 to 10 carbon atoms, Ph is a phenyl group, x is 10 to 500, a is 1 to 50, R2 is hydrogen or an alkyl group with 1 to 10 carbon atoms, y is 10 to 500, and b is 1 to 50.

3. The block copolymer of claim 2 , wherein
in Chemical Formula 1, COM1 comprises a group represented by Chemical Formula 3, and in Chemical Formula 2, COM2 comprises a group represented by Chemical Formula 4:

wherein Ph is a phenyl group and Me is methyl, n is 10 to 1000, m is 10 to 1000, and * means a point of attachment.

4. The block copolymer of claim 2 , wherein
the block copolymer is represented by Chemical Formula 5:

wherein Ph is a phenyl group, Me is methyl, x is 10 to 500, y is 10 to 500, n is 10 to 1000 and m is 10 to 1000.

5. The block copolymer of claim 1 , wherein
the first block and the second block is connected to each other randomly.

6. A method of making a block copolymer, comprising:
synthesizing the block copolymer of claim 2 in the presence of a compound of Chemical Formula 6:

wherein OTBS is a tert-butyldimethylsilyloxy group, and a is 1 to 10.

7. The method of claim 6 , wherein
the material of Chemical Formula 6 is synthesized based on Reaction Equation 1:

wherein TBSC 1 is tert-butyldimethylsilyl chloride, and OTBS is tert-butyldimethylsilyloxy group.

8. The method of claim 5 , wherein
the block copolymer is made by polymerizing a first macromer represented by Chemical Formula 7 or Chemical Formula 7-1 and a second macromer represented by Chemical Formula 8 by a ring opening metathesis polymerization method:

wherein Ph is a phenyl group, Me is methyl, a is 1 to 10, n is 10 to 1000, b is 1 to 10, and m is 10 to 1000.

9. The method of claim 8 , wherein
the first macromer represented by Chemical Formula 7 is synthesized based on Reaction Equation 2:

wherein OTBS is a tert-butyldimethylsilyl oxy group, Ph is phenyl, and n is 10 to 1000.

10. The method of claim 8 , wherein
the second macromer is synthesized based on Reaction Equation 3:

wherein Ph is phenyl, Me is methyl, OTBS is tert-butyldimethylsilyl oxy group, and m is 10 to 1000.

11. The method of claim 8 , wherein
a Grubbs catalyst is present during the polymerization of the first macromer and the second macromer.

12. The method of claim 8 , wherein
the first macromer represented by Chemical Formula 7-1 is synthesized based on Reaction Equation 4:

wherein Ph is phenyl, and n is 10 to 1000.

13. A pattern formation method comprising:
coating the block copolymer of claim 2 on a substrate comprising a mother pattern layer to form a polymer thin film;
selectively removing one block of a first block and a second block from the polymer thin film; and
etching the mother pattern layer by using the polymer thin film from which one block is removed as a mask.

14. The pattern formation method of claim 13 , wherein the polymer thin film is treated with ultraviolet rays or heat.

Assignees

• Samsung Display Co Ltd
• Univ Korea Res & Bus Found
• Univ Sogang Res Foundation

Inventors

• Kang Min Hyuck
• Lee Su Mi
• Kim Myung Im
• Kim Tae Woo
• Park Seung-Won
• Lei Xie
• Kang na na
• Moon Bong-Jin
• Bang Joona
• Woo Sang Hoon
• Lee Jin Yeong
• Jung Hyun Jung
• Huh June

Classifications

• A43B7/32

  with shock-absorbing means (resilient soles A43B13/18) · CPC title

• A43B3/246

  characterised by the sole · CPC title

• A43B7/223

  characterised by the constructive form · CPC title

• A43B3/101 Primary

  Slippers, e.g. flip-flops or thong sandals · CPC title

• A43B3/108

  characterised by the sole · CPC title