Substrate processing system and substrate transferring method

US9252034B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9252034-B2
Application numberUS-201113578237-A
CountryUS
Kind codeB2
Filing dateFeb 17, 2011
Priority dateFeb 19, 2010
Publication dateFeb 2, 2016
Grant dateFeb 2, 2016

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A substrate processing system and substrate transferring method is capable of improving substrate-transferring efficiency by transferring a substrate bi-directionally through a substrate transferring device between two rows of processing chambers, and transferring the substrate to a precise position by rotating the substrate transferring device. The processing system includes a transfer chamber, a bi-directional substrate transferring device; and processing chambers which apply a semiconductor-manufacturing process to the substrate. The processing chambers are linearly arranged along two confronting rows, and the transfer chamber is between the two rows of processing chambers. The substrate transferring device includes a moving unit inside the transfer chamber; a bi-directional substrate transferring unit in the moving unit, that transfers the substrate to the processing chamber through a bi-directional sliding movement; and a rotating unit between the moving unit and the bi-directional substrate transferring unit, that rotates the bi-directional substrate transferring unit at a predetermined angle.

First claim

Opening claim text (preview).

What is claimed is: 1. A substrate processing system comprising: a transfer chamber which has at least one bi-directional substrate transferring device having a base frame bi-directionally transferring a substrate; and a plurality of processing chambers which apply a semiconductor-manufacturing process to the substrate, wherein the plurality of processing chambers are linearly arranged along two rows confronting each other, and the transfer chamber is between the two rows of the processing chambers, wherein the at least one bi-directional substrate transferring device comprises: a moving unit which is inside the transfer chamber and that moves horizontally, the moving unit including a driving member at an upper surface thereof and first rotating guides at corners of the upper surface of the moving unit, wherein the first rotating guides are connected to second rotating guides at corners of the base frame corresponding to the corners of the moving unit; a bi-directional substrate transferring unit which is in the moving unit, and transfers the substrate to the processing chamber through a bi-directional sliding movement, and transfers the substrate to the processing chamber through a bi-directional sliding movement; and a rotating unit having a rotation member and a housing therein, wherein the rotating unit is between the moving unit, the bi-directional substrate transferring unit, and the first and second rotating guides, and is configured to rotate the second rotating guides of the base frame at a predetermined angle by linearly moving the housing by rotation of the rotation member according to the driving member, wherein the second rotating guides follow the first rotating guides. 2. The substrate processing system according to claim 1 , wherein the bi-directional substrate transferring unit comprises: the base frame which is in the moving unit; a fork frame which is on the base frame; first and second bi-directional sliding forks which have a plurality of bi-directional sliding members in the fork frame; and a fork lift which is at a lateral side of the fork frame, the fork lift lifting or lowering the first and second bi-directional sliding forks by lifting or lowering the fork frame. 3. The substrate processing system according to claim 2 , wherein the rotating unit comprises: a first rotating guide at each corner of an upper surface of the moving unit; a rotating part at the upper surface of the moving unit; a second rotating guide at a rear surface of the base frame, following the first rotating guide; and a rotating axis part at the rear surface of the base frame, wherein the rotating axis part linearly moves by rotation of the rotating part, and makes the base frame rotate at a predetermined angle by rotation of the second rotating guide. 4. The substrate processing system according to claim 3 , wherein the rotating unit comprises: a first bracket at the upper surface of the moving unit; a second bracket at the upper surface of the moving unit, at a predetermined interval from the first bracket; wherein the rotation member is rotatably supported by the first bracket while passing through the second bracket; the driving member is connected with the rotation member, and rotates the rotation member; and the housing is in the rotation member, and makes the rotating axis part move linearly. 5. The substrate processing system according to claim 4 , wherein the rotating axis part comprises: a first support plate at the rear surface of the base frame; a rotating axis in the first support plate; and a second support plate in the rotating axis and the housing, wherein the second support plate makes the base frame rotate at a predetermined angle by rotation of the second rotating guide. 6. The substrate processing system according to claim 3 , wherein the first and second rotating guides have a curved shape with a predetermined curvature. 7. The substrate processing system according to claim 2 , wherein the first bi-directional sliding fork simultaneously slides both the first and second sliding forks by a linear motor; and each of the plurality of sliding members slides bi-directionally while being extended or retracted by a hydraulic or pneumatic pressure. 8. The substrate processing system according to claim 2 , wherein the first bi-directional sliding fork comprises a position-detecting sensor configured to control the first fork slider by detecting a sliding position of the sliding members. 9. A substrate processing system comprising: first and second processing chambers confronting each other and arranged in parallel, the first and second processing chambers applying a semiconductor-manufacturing process to a substrate; and at least one bi-directional substrate transferring device having a base frame and a moving unit including a driving member at an upper surface thereof and first rotating guides at corners of the upper surface of the moving unit, wherein the first rotating guides are connected to second rotating guides at corners of the base frame corresponding to the corners of the moving unit, the bi-directional substrate transferring device being between the first and second processing chambers, the at least one bi-directional substrate transferring device transferring the substrate to the first or second processing chamber by simultaneously sliding a plurality of sliding members, wherein the at least one bi-directional substrate transferring device comprises a rotating unit having a rotation member and a housing therein, wherein the rotating unit is between the first and second rotating guides, plurality of sliding members and the second rotating guides at a predetermined angle by linearly moving the housing by rotation of the rotation member according to the driving member, wherein the second rotating guides follow the first rotating guides. 10. The substrate processing system according to claim 9 , wherein the at least one bi-directional substrate transferring device further comprises: a moving unit inside the transfer chamber, which moves horizontally; a bi-directional substrate transferring unit in the moving unit, and that transfers the substrate to the processing chamber through a bi-directional sliding movement, and wherein the rotating unit is between the moving unit and the bi-directional substrate transferring unit, and rotates the bi-directional substrate transferring unit at a predetermined angle. 11. The substrate processing system according to claim 10 , wherein the bi-directional substrate transferring unit comprises: a base frame in the moving unit; a fork frame on the base frame; first and second bi-directional sliding forks which have a plurality of bi-directional sliding members in the fork frame; and a fork lift at a lateral side of the fork frame, the fork lift lifting or lowering the first and second bi-directional sliding forks by lifting or lowering the fork frame. 12. The substrate processing system according to claim 11 , wherein the rotating unit comprises: a first rotating guide at each corner of an upper surface of the moving unit; a rotating part at the upper surface of the moving unit; a second rotating guide at a rear surface of the base frame following the first rotating guide; and a rotating axis part at the rear surface of the base frame, wherein the rotating axis part linearly moves by rotation of the rotating part, and makes the base frame rotate at a predetermined angle by rotation of the second rotating guide. 13. The substrate processing system according to claim 12 , wherein the rotating unit comprises: a first bracket at the upper surface of the moving u

Assignees

Inventors

Classifications

  • Mechanical parts of transfer devices · CPC title

  • in-line arrangement · CPC title

  • Coaxial drive motors · CPC title

  • Sheet handling, means, e.g. manipulators, devices for turning or tilting sheet glass (suction cups B65G49/061; combined with vertical conveyors C03B33/00 - C03B33/10; stacking and destacking B65G49/068) · CPC title

  • Controlled or contamination-free environments or clean space conditions · CPC title

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What does patent US9252034B2 cover?
A substrate processing system and substrate transferring method is capable of improving substrate-transferring efficiency by transferring a substrate bi-directionally through a substrate transferring device between two rows of processing chambers, and transferring the substrate to a precise position by rotating the substrate transferring device. The processing system includes a transfer chamber…
Who is the assignee on this patent?
Lee Kyoo Hwan, Moon Deck Won, Jang Jae Hwan, and 1 more
What technology area does this patent fall under?
Primary CPC classification H10P72/0456. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Feb 02 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).