Laterally driven probes for semiconductor testing

Patent metadata

Field	Value
Publication number	US-9250290-B2
Application number	US-201313850205-A
Country	US
Kind code	B2
Filing date	Mar 25, 2013
Priority date	Mar 23, 2012
Publication date	Feb 2, 2016
Grant date	Feb 2, 2016

Abstract

A method for testing a semiconductor device. The method comprises moving a probe in a vertical direction towards an electrical structure on a semiconductor device to position the probe alongside the electrical structure. A tip of the probe is positioned lower than an elevation of an outermost periphery of the electrical structure. The method also includes moving the probe in a lateral direction towards the electrical structure to contact the electrical structure. The probe tip mechanically and electrically engages the electrical structure.

First claim

What is claimed is:

1. A method for testing a semiconductor device, the method comprising:
moving a probe in a vertical direction towards an electrical structure on a semiconductor device to position the probe alongside the electrical structure, wherein a tip of the probe is positioned lower than an elevation of an outermost periphery of the electrical structure; and
moving the probe in a lateral direction towards the electrical structure to contact the electrical structure, wherein the probe tip mechanically and electrically engages the electrical structure.

2. The method of claim 1 , wherein the probe tip exerts a force against the electrical structure that is proportional to an amount of lateral overdrive after first mechanical contact between the probe tip and the electrical structure, wherein the lateral overdrive is an amount of lateral movement of the probe.

3. The method of claim 1 further comprising, after contact with the electrical structure, moving the probe tip over an upper surface of the electrical structure and away from the outermost periphery of the electrical structure.

4. The method of claim 1 , wherein the probe tip is positioned substantially in the middle of a space defined by the outermost periphery of the electrical structure and an outermost periphery of an adjacent electrical structure.

5. The method of claim 1 further comprising withdrawing the probe from the electrical structure along a direction substantially orthogonal to an upper surface of the semiconductor device.

6. The method of claim 1 , wherein a shank of the probe is a vertical cylinder comprising a round, triangular, square, rectangular, or oblong cross-section.

7. The method of claim 1 , wherein moving the probe in a lateral direction after the probe tip contacts the electrical structure causes tension in a shank of the probe.

8. The method of claim 1 further comprising sonically scrubbing the probe tip against the electrical structure after the probe tip makes contact with the electrical structure to mechanically and electrically engage the probe tip with the electrical structure.

9. An apparatus for electrically testing a semiconductor device, the apparatus comprising:
a probe card comprising a probe, wherein the probe comprises a vertical shank and a probe tip;
wherein the probe card is operable to position the probe above a semiconductor device such that the probe is positioned alongside an electrical structure of the semiconductor device and the probe tip of the probe is positioned lower than an elevation of an outermost periphery of the electrical structure;
wherein the probe card is further operable to move the probe in a lateral direction towards the electrical structure to contact the electrical structure, and wherein the probe tip is operable to mechanically and electrically engage the electrical structure.

10. The apparatus of claim 9 , wherein the probe card is further operable to exert a force with the probe tip against the electrical structure that is proportional to an amount of lateral overdrive after first mechanical contact between the probe tip and the electrical structure, and wherein the lateral overdrive is an amount of lateral movement of the probe.

11. The apparatus of claim 9 , wherein the probe tip is positioned substantially in the middle of a space defined by the outermost periphery of the electrical structure and an outermost periphery of an adjacent electrical structure.

12. The apparatus of claim 9 , wherein the probe card is further operable to withdraw the probe from the electrical structure along a direction substantially orthogonal to an upper surface of the semiconductor device.

13. The apparatus of claim 9 , wherein the vertical shank of the probe comprises a vertical cylinder comprising a round, triangular, square, rectangular, or oblong cross-section.

14. The apparatus of claim 9 , wherein the probe card is further operable to place the vertical shank of the probe in tension by moving the probe in a lateral direction towards the electrical structure after contacting the electrical structure.

15. The apparatus of claim 9 further comprising a sonic unit operable to sonically scrub the probe tip against the electrical structure after the probe tip makes contact with the electrical structure to mechanically and electrically engage the probe tip with the electrical structure.

16. The apparatus of claim 9 , wherein the probe further comprises a horizontal beam and at least one foot, wherein the shank is connected to the horizontal beam and the horizontal beam is connected to the at least one foot that is connected to a probe card of the apparatus.

17. The apparatus of claim 16 , wherein the horizontal beam bends when the probe tip moves in a lateral direction towards an upper surface of the electrical structure and away from the outermost periphery of the electrical structure along a path substantially perpendicular to the horizontal beam after the probe tip contacts the electrical structure.

18. The apparatus of claim 16 , wherein the horizontal beam torsions when the probe tip moves in a lateral direction towards an upper surface of the electrical structure and away from the outermost periphery of electrical structure along a path substantially perpendicular to the horizontal beam after the probe tip contacts the electrical structure.

19. The apparatus of claim 9 , wherein the probe tip comprises a triangular cross-section.

20. A non-transitory computer-readable medium having computer-readable program code embodied therein for causing a computer system to perform a method for testing a semiconductor device, the method comprising:
moving a probe in a vertical direction towards an electrical structure on a semiconductor device to position the probe alongside the electrical structure, wherein a tip of the probe is positioned lower than an elevation of an outermost periphery of the electrical structure; and
moving the probe in a lateral direction towards the electrical structure to contact the electrical structure, wherein the probe tip mechanically and electrically engages the electrical structure.

Assignees

• Advantest Corp

Inventors

• Namburi Lakshmikanth
• Cros Florent
• Desta Yohannes

Classifications

• G01R1/06716

  Elastic · CPC title

• G01R1/06727

  Cantilever beams · CPC title

• G01R31/2887 Primary

  involving moving the probe head or the IC under test; docking stations (moving single probes G01R1/06705; moving individual probes in multiple probes G01R1/07392) · CPC title

• H10P74/00 Primary

  Testing or measuring during manufacture or treatment of wafers, substrates or devices · CPC title