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Method for double-side vacuum film formation and laminate obtainable by the method
US9249503B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9249503-B2 |
| Application number | US-201213559094-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jul 26, 2012 |
| Priority date | Jul 29, 2011 |
| Publication date | Feb 2, 2016 |
| Grant date | Feb 2, 2016 |
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Abstract
Official abstract text for this publication.
The film formation method comprises the steps of: unrolling and feeding an elongated substrate wound in a roll form from a first roll chamber in a first direction from the first roll chamber toward a second roll chamber, using a first surface as a surface for film formation; degassing the substrate fed in the first direction; forming a second material film on the first surface of the substrate in a second film formation chamber; taking up the substrate in a roll form in the second roll chamber, the substrate having the second material film formed thereon; unrolling and feeding the substrate from the second roll chamber in a second direction from the second roll chamber toward the first roll chamber; forming a first material film on the second material film in a first film formation chamber; taking up the substrate in a roll form in the first roll chamber.
First claim
Opening claim text (preview).
What is claimed is: 1. A method for continuously subjecting an elongated substrate to vacuum film formation, comprising the steps of: a) unrolling and feeding an elongated substrate wound in a roll form from a first roll chamber in a first direction from the first roll chamber toward a second roll chamber, using a first surface as a surface for film formation; b) degassing the substrate fed in the first direction; c) forming, in a second film formation chamber, a second materi…
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Classifications
Cross-Sectional Technologies · mapped topic
- C23C14/562Primary
Chemistry & Metallurgy · mapped topic
- C23C14/56Primary
Chemistry & Metallurgy · mapped topic
Physics · mapped topic
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- What does patent US9249503B2 cover?
- The film formation method comprises the steps of: unrolling and feeding an elongated substrate wound in a roll form from a first roll chamber in a first direction from the first roll chamber toward a second roll chamber, using a first surface as a surface for film formation; degassing the substrate fed in the first direction; forming a second material film on the first surface of the substrate …
- Who is the assignee on this patent?
- Nashiki Tomotake, Sakata Yoshimasa, Sugawara Hideo, and 5 more
- What technology area does this patent fall under?
- Primary CPC classification C23C14/562. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Feb 02 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).