Circuit apparatus having a rounded trace

Patent metadata

Field	Value
Publication number	US-9229318-B2
Application number	US-87004110-A
Country	US
Kind code	B2
Filing date	Aug 27, 2010
Priority date	Aug 27, 2010
Publication date	Jan 5, 2016
Grant date	Jan 5, 2016

Abstract

In various embodiments of the present invention a circuit apparatus having a rounded trace, a method to manufacture the circuit apparatus, and a design structure used in the design, testing, or manufacturing of the circuit apparatus are described. An artwork layer having an adaptable-mask section allows a graded amount of light to pass into an underlying photoresist layer. Subsequent to developing the photoresist layer, the graded amount of light creates a rounded geometric void used as a mold or sidewall for the creation of at least a portion of a rounded trace. The photoresist layer is removed resulting in a circuit apparatus having a rounded trace.

First claim

The invention claimed is:

1. A circuit apparatus comprising:
a photoresist layer applied directly upon a substrate; and
an artwork layer directly placed upon the photoresist layer, the artwork layer having at least an adaptable-mask section that allows a graded amount of light to pass therethrough adjacent to and coplanar with at least a continuous-mask section.

2. The circuit apparatus of claim 1 , wherein the adaptable-mask section has one or more attenuated sections.

3. The circuit apparatus of claim 1 , wherein the continuous-mask section allows a similar amount of light to pass therethrough.

4. The circuit apparatus of claim 1 wherein, light passing through first adaptable-mask section penetrates the photoresist layer at a graded depth.

5. A circuit apparatus comprising:
a first photoresist layer applied directly upon a substrate;
a second photoresist layer applied directly upon the first photoresist layer; and
an artwork layer directly placed upon the second photoresist layer, the artwork layer having at least an adaptable-mask section that allows a graded amount of light to pass therethrough adjacent to and coplanar with at least a continuous-mask section.

6. The circuit apparatus of claim 5 wherein the second photoresist layer has one or more oppositely attenuated sections relative to one or more attenuated sections of the first photoresist layer.

7. The circuit apparatus of claim 5 , wherein, light passing through the adaptable-mask section penetrates the second photoresist layer at a graded depth.

Assignees

• Doyle Matthew S
• Kuczynski Joseph
• Splittstoesser Kevin A
• Tofil Timothy J
• Globalfoundries Inc

Inventors

• Doyle Matthew S
• Kuczynski Joseph
• Splittstoesser Kevin A
• Tofil Timothy J

Classifications

• H05K3/18

  using precipitation techniques to apply the conductive material · CPC title

• G03F7/0035 Primary

  Multiple processes, e.g. applying a further resist layer on an already in a previously step, processed pattern or textured surface · CPC title

• G03F7/2002

  with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image · CPC title

• H05K2203/056

  Using an artwork, i.e. a photomask for exposing photosensitive layers · CPC title

• H05K2203/1476

  Same or similar kind of process performed in phases, e.g. coarse patterning followed by fine patterning · CPC title