Wafer level packaged infrared (IR) focal plane array (FPA) with evanescent wave coupling

US9227839B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9227839-B2
Application numberUS-201414270945-A
CountryUS
Kind codeB2
Filing dateMay 6, 2014
Priority dateMay 6, 2014
Publication dateJan 5, 2016
Grant dateJan 5, 2016

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

A structure for detecting electromagnetic radiation having a predetermined wavelength. The structure includes a device wafer having a sensing element disposed on a predetermined region of a surface of the device wafer responsive to the electromagnetic radiation. A cover wafer is provided having a region thereof transparent to the electromagnetic radiation for passing the electromagnetic radiation through the transparent region onto a surface of the sensing element. A bond gap spacer structure is provided for supporting the surface of the sensing element from an opposing surface of the transparent region of the cover wafer a distance less than a fraction of the predetermined wavelength when the cover wafer is bonded to the device wafer.

First claim

Opening claim text (preview).

What is claimed is: 1. A structure for detecting electromagnetic radiation having a predetermined wavelength, comprising: a device wafer having a sensing element disposed on a predetermined region of a surface of the device wafer responsive to the electromagnetic radiation; a cover wafer having a region thereof transparent to the electromagnetic radiation for passing the electromagnetic radiation through the transparent region onto a r:mrfoce of the sensing element; a bond gap spacer structure for supporting the surface of the sensing element from an opposing surface of the transparent region of the cover wafer a predetermined distance less than a fraction of the predetermined wavelength when the cover wafer is bonded to the device wafer, wherein the bond gap spacer forms a gap between the surface of the sensing element and the opposing surface of the transparent region of the cover wafer to enable evanescent wave coupling across the gap. 2. A structure for detecting electromagnetic radiation having a predetermined wavelength, comprising: a device wafer having a sensing element disposed on a predetermined region of a surface of the device wafer responsive to the electromagnetic radiation; a bulk silicon cover wafer having a region thereof transparent to the electromagnetic radiation for passing the electromagnetic radiation through the transparent region onto a surface of the sensing element: a bond gap spacer structure for supporting the surface of the sensing element from an opposing surface of the transparent region of the bulk silicon cover wafer a predetermined distance less than a fraction of the predetermined wavelength when the cover wafer is bonded to the device wafer, wherein the bond gap spacer forms a gap between the surface of the sensing element and the opposing surface of the transparent region of the cover wafer to enable evanescent wave coupling across the gap. 3. The structure recited in claim 2 wherein the cover wafer has a thickness of about 500 to 700 microns, and a groove having a depth of about 25 to 50 micrometers disposed in surface thereof and disposed about the window, the window being disposed in the inner portion of the cover wafer. 4. The structure recited in claim 2 wherein the bond gap spacer forms a gap between the surface of the sensing element and the opposing surface of the transparent region of the cover wafer to enable evanescent wave coupling across the gap. 5. The structure recited in claim 2 , wherein the wavelength is between 7 to 13 micrometers. 6. The structure recited in claim 5 wherein the gap is about 10,000 to 25, 000 Angstroms. 7. The structure recited in claim 3 wherein the wavelength is between 7 to 13 micrometers. 8. The structure recited in claim 7 wherein the gap is about about 10,000 to 25,000 Angstroms. 9. The structure recited in claim 2 , wherein the sensing element is a bolometer. 10. The structure recited in claim 2 wherein the sensing element is a bolometer. 11. The structure recited in claim 3 wherein the sensing element is a bolometer. 12. The structure recited in claim 4 wherein the sensing element is a bolometer. 13. The structure recited in claim 5 wherein the sensing element is a bolometer. 14. The structure recited in claim 6 wherein the sensing element is a bolometer.

Assignees

Inventors

Classifications

  • Means for wavelength selection or discrimination · CPC title

  • Packaging optical devices · CPC title

  • Electricity · mapped topic

  • B81B7/0067Primary

    for controlling the passage of optical signals through the package · CPC title

  • for maintaining a controlled atmosphere inside of the chamber containing the MEMS · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US9227839B2 cover?
A structure for detecting electromagnetic radiation having a predetermined wavelength. The structure includes a device wafer having a sensing element disposed on a predetermined region of a surface of the device wafer responsive to the electromagnetic radiation. A cover wafer is provided having a region thereof transparent to the electromagnetic radiation for passing the electromagnetic radiati…
Who is the assignee on this patent?
Raytheon Co
What technology area does this patent fall under?
Primary CPC classification B81C1/00317. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Jan 05 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).