Rugged, single crystal wide-band-gap-material scanning-tunneling-microscopy/lithography tips
US-2021263069-A1 · Aug 26, 2021 · US
US9222959B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9222959-B2 |
| Application number | US-74796608-A |
| Country | US |
| Kind code | B2 |
| Filing date | Dec 9, 2008 |
| Priority date | Dec 14, 2007 |
| Publication date | Dec 29, 2015 |
| Grant date | Dec 29, 2015 |
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The invention relates to a nanofiber fabrication method comprising nanofiber growth from a catalyst zone, furthermore comprising the following steps: producing at least one micropattern ( 11 ) on the surface of a substrate ( 1 ); producing a catalyst zone ( 50 ) on the surface of said micropattern; nanofiber growth from the catalyst zone, characterized in that the micropattern ( 11 ) comprises a base, at least partially convergent side walls and an upper face, said base being covered with a so-called “poison” layer ( 4 ) where no nanofiber growth catalysis effect can take place, the so-called “poison” layer not being present on said upper face; the base being covered with a catalyst layer ( 5 ) on the surface of the so-called “poison” layer; the thickness of the “poison” layer and the thickness of the catalyst layer being such that the nanofibers cannot grow either on the side walls or on the base of the micropatterns constructed beforehand.
Opening claim text (preview).
What is claimed is: 1. A nanofiber fabrication method for nanofiber growth from a catalyst zone, the method comprising the following steps: producing at least one micropattern on the surface of a substrate, said micropattern having a base, partially convergent sidewalls and an upper face; producing a catalyst zone on the upper face of the micropattern; covering the base with a poison layer for preventing nanofiber growth catalysis; preventing the poison layer from covering the upper face; covering the poison layer on the base with a catalyst layer; dewetting the catalyst zone to form a droplet on the upper face of the micropattern by heating the substrate, wherein the droplet on the upper face is substantially larger than any and all droplets on the sidewalls; and growing the nanofiber from the droplet in the presence of a target; the thickness of the poison layer and the thickness of the catalyst layer being such that no nanofibers are grown on the sidewalls or on the base. 2. The nanofiber fabrication method as claimed in claim 1 , in which the production of the micropattern comprises the following steps: depositing a layer of hard mask material having a dry etching behavior different from that of the substrate; depositing a layer of photoresistive material capable of becoming insoluble under the effect of exposure on the surface of the hard mask; exposing the photoresistive material through a mask so as to define an insoluble part within the layer of photoresistive material; dissolving the layer of photoresistive material at the periphery of the insoluble part so as to define an insoluble element; etching the hard mask at the periphery of the insoluble element so as to define an etch zone; etching the substrate, leading to the production of at least one micropattern on the surface of the substrate covered with the etch zone and the insoluble element on its upper face. 3. The nanofiber fabrication method as claimed in claim 2 , characterized in that the etching of the hard mask is anisotropic etching. 4. The nanofiber fabrication method as claimed in one of claims 2 and 3 , in which the etching of the substrate is a chemical etching operation. 5. The nanofiber fabrication method as claimed in claim 4 , in which the micropattern production further comprises a dry etching step following the chemical etching operation so as to constitute a micropattern referred to as elevated relative to the substrate, the micropattern having a first part with straight side walls and a second part with convergent side walls. 6. The nanofiber fabrication method as claimed in claim 5 , in which the intermediate dry etching operation is etching of the R.I.E. type. 7. The nanofiber fabrication method as claimed in one of claim 1 or 2 , further comprising: depositing a poison layer on the base of the micropattern; depositing a catalyst layer on all of the substrate of the micropattern covered on its base with the poison layer. 8. The nanofiber fabrication method as claimed in claim 7 , in which the thickness of the catalyst layer is about fifty nanometers. 9. The nanofiber fabrication method as claimed in claim 7 , in which the thickness of the catalyst layer is less than about fifty nanometers. 10. The nanofiber fabrication method as claimed in claim 1 , in which the poison layer is made of the same material as the catalyst layer, and has a thickness of more than about fifty nanometers. 11. The nanofiber fabrication method as claimed in one of claim 1 or 2 , in which the cross-sectional dimensions of the micropattern are of the order of 100 to 1000 nanometers. 12. The nanofiber fabrication method as claimed in claim 1 , in which the heating of the substrate is carried out at a temperature of between about 300 degrees and 800 degrees. 13. The nanofiber fabrication method as claimed in one of claim 1 or 2 , in which the substrate is made of silicon. 14. The nanofiber fabrication method as claimed in claim 2 , in which the hard mask layer is made of silicon dioxide. 15. The nanofiber fabrication method as claimed in claim 2 , in which the hard mask layer is made of a nitride of the Ni x Si y nitride type. 16. The nanofiber fabrication method as claimed in one of claim 1 or 2 , in which the poison layer is a layer of nickel with a thickness of about 100 nanometers. 17. The nanofiber fabrication method as claimed in one of claim 1 or 2 , in which the poison layer is a layer of copper or molybdenum or tungsten. 18. The nanofiber fabrication method as claimed in one of claim 1 or 2 , in which the catalyst layer is a layer of nickel or iron or cobalt or a palladium-nickel alloy.
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