Three dimensional integrated circuit capacitor having vias

Patent metadata

Field	Value
Publication number	US-9202785-B2
Application number	US-201314074972-A
Country	US
Kind code	B2
Filing date	Nov 8, 2013
Priority date	Nov 8, 2013
Publication date	Dec 1, 2015
Grant date	Dec 1, 2015

Abstract

A three dimensional integrated circuit capacitor that includes a first conductive layer, a second conductive layer above the first conductive layer and a semiconductor layer above the second conductive layer. The semiconductor layer has an inter layer via (ILV) through the semiconductor layer. A third conductive layer is above the semiconductor layer and a fourth conductive layer is above the third conductive layer. A first conductive plate has fingers on at least two of the first conductive layer, the second conductive layer, the third conductive layer and the fourth conductive layer. A second conductive plate has fingers on at least two of the first conductive layer, the second conductive layer, the third conductive layer and the fourth conductive layer. An insulating layer is between the first conductive plate and the second conductive plate.

First claim

What is claimed is:

1. A three dimensional integrated circuit capacitor, comprising:
a first conductive layer;
a second conductive layer above the first conductive layer;
a semiconductor layer above the second conductive layer, the semiconductor layer having an inter layer via (ILV) through the semiconductor layer;
a third conductive layer above the semiconductor layer;
a fourth conductive layer above the third conductive layer;
a first conductive plate having fingers on at least two of the first conductive layer, the second conductive layer, the third conductive layer and the fourth conductive layer;
a second conductive plate having fingers on at least two of the first conductive layer, the second conductive layer, the third conductive layer and the fourth conductive layer; and
an insulating layer between the first conductive plate and the second conductive plate.

2. The three dimensional integrated circuit capacitor of claim 1 , wherein the first conductive plate further comprises:
a connection via above and electrically connected to the ILV; and
a connection via below and electrically connected to the ILV.

3. The three dimensional integrated circuit capacitor of claim 1 , wherein a portion of the first conductive plate is electrically connected to the ILV.

4. The three dimensional integrated circuit capacitor of claim 1 , wherein the three dimensional integrated circuit capacitor is a portion of a radio frequency (RF) circuit.

5. The three dimensional integrated circuit capacitor of claim 1 , wherein the first conductive plate is U-shaped and the second conductive plate is T-shaped.

6. The three dimensional integrated circuit capacitor of claim 1 , wherein the first conductive plate is U-shaped and the second conductive plate is T-shaped in a first capacitive section and the first conductive plate is T-shaped and the second conductive plate is U-shaped in a second capacitive section.

7. The three dimensional integrated circuit capacitor of claim 1 , wherein the first conductive plate is rectangular-shaped and the second conductive plate is bar-shaped.

8. The three dimensional integrated circuit capacitor of claim 1 , wherein the first conductive plate and the second conductive plate include a metal oxide metal capacitor (MOMCAP) portion and a metal oxide semiconductor capacitor (MOSCAP) portion.

9. A three dimensional integrated circuit capacitor, comprising:
a first conductive layer;
a semiconductor layer above the first conductive layer, the semiconductor layer having an inter layer via (ILV) through the semiconductor layer;
a second conductive layer above the semiconductor conductive layer;
a first conductive plate having first fingers on one of the first conductive layer and the second conductive layer, the first fingers electrically connected to the ILV;
a second conductive plate having fingers on one of the first conductive layer and the second conductive layer, the second fingers electrically coupled to the semiconductor layer; and
an insulating layer between the first conductive plate and the second conductive plate
a metal oxide semiconductor capacitor (MOSCAP) having a metal portion, an oxide portion and a semiconductor portion, wherein the metal portion includes the ILV, the oxide portion includes at least a part of the insulating layer and the semiconductor portion includes at least a part of the semiconductor layer not including the ILV.

10. The three dimensional integrated circuit capacitor of claim 9 , wherein the first conductive plate further comprises:
a connection via above and electrically connected to the ILV; and
a connection via below and electrically connected to the ILV.

11. The three dimensional integrated circuit capacitor of claim 9 , wherein a portion of the first conductive plate on the second conductive layer is electrically connected to the ILV.

12. The three dimensional integrated circuit capacitor of claim 9 , wherein the first conductive plate is U-shaped and the second conductive plate is T-shaped.

13. The three dimensional integrated circuit capacitor of claim 9 , wherein the first conductive plate is U-shaped and the second conductive plate is T-shaped in a first capacitive section and the first conductive plate is T-shaped and the second conductive plate is U-shaped in a second capacitive section.

14. The three dimensional integrated circuit capacitor of claim 9 , wherein the first conductive plate is rectangular-shaped and the second conductive plate is bar-shaped.

15. The three dimensional integrated circuit capacitor of claim 9 , wherein the first conductive plate and the second conductive plate include a metal oxide metal capacitor (MOMCAP).

16. A three dimensional integrated circuit capacitor, comprising:
a first semiconductor layer having a first inter layer via (ILV);
a second semiconductor layer above the first semiconductor layer having a second ILV;
a first conductive gate layer between the first semiconductor layer and the second semiconductor layer electrically connected to the first ILV and the second ILV;
a first conductive plate,
wherein the first conductive plate includes the first conductive gate layer, the first ILV and the second ILV;
a second conductive plate,
wherein the second conductive plate includes the first semiconductor layer and the second semiconductor layer; and
an insulating layer between the first conductive plate and the second conductive plate,
wherein the first conductive plate and the second conductive plate form a metal oxide semiconductor capacitor (MOSCAP).

17. The three dimensional integrated circuit capacitor of claim 16 , further comprising:
a second gate layer above the second semiconductor layer, the second gate layer electrically connected to the second ILV,
wherein the first conductive plate includes the second gate layer; and
a third semiconductor layer above the second gate layer, the third semiconductor layer electrically connected to the second semiconductor layer,
wherein the second conductive plate includes the third semiconductor layer.

18. The three dimensional integrated circuit capacitor of claim 16 , wherein the first conductive plate further comprises:
a connection via above and electrically connected to the ILV; and
a connection via below and electrically connected to the ILV.

19. The three dimensional integrated circuit capacitor of claim 16 , wherein a portion of the first conductive plate is electrically connected to the ILV.

20. The three dimensional integrated circuit capacitor of claim 16 , wherein the MOSCAP comprises a first MOSCAP portion between the first semiconductor layer and the first conductive gate layer, and a second MOSCAP portion between the first conductive gate layer and the second semiconductor layer.

Assignees

• Taiwan Semiconductor Mfg

Inventors

• Yen Hsiao-Tsung
• Luo Cheng-Wei

Classifications

• H10W20/496 Primary

  Capacitor integral with wiring layers · CPC title

• H10D1/716

  having vertical extensions · CPC title

• H10D1/714

  having horizontal extensions · CPC title

• H01L28/86

  Electricity · mapped topic

• H01L23/5223 Primary

  Electricity · mapped topic