Silicon precursors for silicon nitride deposition
US-11996286-B2 · May 28, 2024 · US
US9200364B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9200364-B2 |
| Application number | US-201113579299-A |
| Country | US |
| Kind code | B2 |
| Filing date | Mar 18, 2011 |
| Priority date | Mar 19, 2010 |
| Publication date | Dec 1, 2015 |
| Grant date | Dec 1, 2015 |
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A film forming apparatus for forming a film on an object includes: a processing container; gas supply means, having gas jet ports, respectively; a holding means for holding the object; a drive mechanism for moving the holding means relative to the gas jet ports; and a control means which, when repeating P times a cycle, consisting of a supply period for supplying a gas and a supply stop period during which the supply of the gas is stopped, performs control so that as viewed from the center of the object, a gas supply starting position is sequentially shifted in the circumferential direction of the object for every cycle in such a manner that the entire circumference of the object to be processed is divided into K segments (K=P), K being an arbitrary division number, and the gas supply starting position is shifted by one segment for every cycle.
Opening claim text (preview).
The invention claimed is: 1. A film forming apparatus for forming an intended film on an object to be processed, comprising: a processing container configured to house the object to be processed; a gas supply means having a gas jet port configured to jet a gas toward the object to be processed; a holding means configured to hold the object to be processed in the processing container; a drive mechanism configured to rotate or periodically move the holding means relative to th…
Chemistry & Metallurgy · mapped topic
Chemistry & Metallurgy · mapped topic
Chemistry & Metallurgy · mapped topic
Chemistry & Metallurgy · mapped topic
Chemistry & Metallurgy · mapped topic
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