Electronic substrates having embedded inductors
US-2024331921-A1 · Oct 3, 2024 · US
Magnetic film enhanced inductor
US9190201B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9190201-B2 |
| Application number | US-39748809-A |
| Country | US |
| Kind code | B2 |
| Filing date | Mar 4, 2009 |
| Priority date | Mar 4, 2009 |
| Publication date | Nov 17, 2015 |
| Grant date | Nov 17, 2015 |
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- Title
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- Abstract
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- First independent claim
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Abstract
Official abstract text for this publication.
An integrated magnetic film enhanced inductor and a method of forming an integrated magnetic film enhanced inductor are disclosed. The integrated magnetic film enhanced inductor includes an inductor metal having a first portion and a second portion, a top metal or bottom metal coupled to the inductor metal, and an isolation film disposed one of in, on, and adjacent to at least one of the first portion and the second portion of the inductor metal. The isolation film includes a magnetic material, such as a magnetic film.
First claim
Opening claim text (preview).
What is claimed is: 1. An inductor comprising: an inductor metal having a first portion and a second portion; a cap layer comprising a top portion on top of at least one of the first portion or the second portion, and a sidewall portion in a space between sidewalls of the first portion and the second portion; and a magnetic material comprising a plurality of magnetic film strips in holes in the top portion and the sidewall portion of the cap layer, wherein a vertical length of…
Assignees
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Classifications
Electricity · mapped topic
Electricity · mapped topic
- H01F17/0006Primary
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
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- What does patent US9190201B2 cover?
- An integrated magnetic film enhanced inductor and a method of forming an integrated magnetic film enhanced inductor are disclosed. The integrated magnetic film enhanced inductor includes an inductor metal having a first portion and a second portion, a top metal or bottom metal coupled to the inductor metal, and an isolation film disposed one of in, on, and adjacent to at least one of the first …
- Who is the assignee on this patent?
- Li Xia, Nowak Matthew, Kang Seung H, and 2 more
- What technology area does this patent fall under?
- Primary CPC classification H01F17/0006. Mapped technology areas include Electricity.
- When was this patent published?
- Publication date Tue Nov 17 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).