Memory cell support lattice

Patent metadata

Field	Value
Publication number	US-9184167-B2
Application number	US-201213590791-A
Country	US
Kind code	B2
Filing date	Aug 21, 2012
Priority date	Aug 21, 2012
Publication date	Nov 10, 2015
Grant date	Nov 10, 2015

Abstract

Memory cell support lattices and methods of forming the same are described herein. As an example, a method of forming a memory cell support lattice includes forming a mask on a number of capacitor elements in an array, such that a space between vertically and horizontally adjacent capacitor elements is fully covered and a space between diagonally adjacent capacitor elements is partially covered and forming a support lattice in a support material by etching the support material to remove portions of the support material below the openings in the mask.

First claim

What is claimed is:

1. A method of forming a memory cell support lattice, the method comprising:
forming a mask on and in contact with a number of capacitor elements in an array,
the mask is in contact with an upper surface and a portion of a sidewall of the number of capacitor elements, and there is an opening between the mask and an upper surface of a support material surrounding the number of capacitor elements,
and forming the mask on the number of capacitor elements includes forming the mask such that a space between vertically and horizontally adjacent capacitor elements is fully covered and a space between diagonally adjacent capacitor elements is partially covered;
and forming a support lattice in the support material by etching the support material to remove portions of the support material below the openings in the mask, a space exists between an upper surface of the support material and a lower surface of the mask.

2. The method of claim 1 , wherein the support material surrounds the number of capacitor elements in the array.

3. The method of claim 1 , wherein the method includes etching the support material by introducing etch materials through the space in the mask between diagonally adjacent capacitor elements to form the support lattice.

4. The method of claim 1 , wherein forming the mask on the number of capacitor elements includes depositing the mask using a physical vapor deposition (PVD) process.

5. The method of claim 1 , wherein the method includes removing a polysilicon material below the support lattice by introducing an etch material through openings in the support lattice.

6. The method of claim 1 , wherein the method includes removing an oxide material below the support lattice by introducing an etch material through openings in the support lattice.

7. The method of claim 1 , wherein forming the support lattice includes forming a self-aligned support lattice.

8. A method of forming a support lattice for memory cells, the method comprising:
forming a number of capacitor elements in a material stack, the material stack includes a support material, a first material below the support material, and a second material above the support material;
removing the second material to expose portions of the number of capacitor elements above the support material and to expose an upper surface of the support material;
forming carbon on and in contact with the number of capacitor elements, there is an opening between the upper surface of the support material and the carbon, and forming carbon on the number of capacitor elements includes forming carbon on an upper surface of the number of capacitor elements that is continuous horizontally and vertically between the number capacitor elements and includes openings diagonally between the number of capacitor elements;
and forming a support lattice by etching the support material to remove portions of the support material below the openings in the carbon.

9. The method of claim 8 , wherein the method includes removing the first material by introducing an etching material through the support lattice to isolate each of the number of electrode portions below the support lattice.

10. The method of claim 8 , wherein the first material and the second material comprise polysilicon.

11. The method of claim 8 , wherein the first material and the second material comprise an oxide.

12. The method of claim 8 , wherein etching the support material to remove portions of the support material below the openings in the carbon includes a dry etch process to form the support lattice with self-aligned openings.

13. The method of claim 8 , wherein the method includes forming a dielectric material on the number of capacitor elements and a number of top electrodes on the number of capacitor elements.

14. A method of forming memory cells in an array, the method comprising:
forming a number of capacitor elements, wherein the number of capacitor elements are each coupled to an access device and the capacitor elements are formed in rectilinear rows and columns;
forming carbon on and in contact with the number of capacitor elements, the carbon is in contact with an upper surface of the number of capacitor elements, and there is an opening between the carbon and an upper surface of a support material surrounding the number of capacitor elements, and forming carbon on the number of capacitor elements includes forming carbon that is continuous horizontally and vertically between the number capacitor elements and includes openings diagonally between the number of capacitor elements;
forming a support lattice that surrounds the number of capacitor elements and includes a number of self-aligned openings between the number of capacitor elements by etching the support material to remove portions of the support material below openings in the carbon on the number of capacitor elements;
forming a dielectric material on the number of capacitor elements; and
forming a number of top electrodes on the number of capacitor elements.

15. The method of claim 14 , wherein the number of openings comprise openings between diagonally adjacent capacitor elements.

16. The method of claim 14 , wherein forming the support lattice includes removing a polysilicon material below a support material by introducing an etch material through the support lattice.

17. The method of claim 14 , wherein the support lattice comprises a nitride material.

18. The method of claim 14 , wherein the support lattice comprises an oxide material.

Assignees

• Song Zhimin
• Lee Che-Chi
• Busch Brett
• Micron Technology Inc

Inventors

• Song Zhimin
• Lee Che-Chi
• Busch Brett

Classifications

• H10P50/283

  by chemical means · CPC title

• H10P50/73

  using masks for insulating materials · CPC title

• H10P14/6329

  using physical ablation of a target, e.g. physical vapour deposition or pulsed laser deposition · CPC title

• H10D1/716

  having vertical extensions · CPC title

• H10D1/042 Primary

  using deposition processes to form electrode extensions · CPC title