Cleaning processing device for biological implant

US9168570B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9168570-B2
Application numberUS-201113823397-A
CountryUS
Kind codeB2
Filing dateSep 5, 2011
Priority dateSep 30, 2010
Publication dateOct 27, 2015
Grant dateOct 27, 2015

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  1. Title

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  2. Abstract

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  4. Key dates

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  5. First independent claim

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Abstract

Official abstract text for this publication.

Provided is a cleaning processing device that is for a biological implant and that is capable of quickly eliminating ozone generated by ultraviolet-ray radiation after completion of ultraviolet-ray radiation towards the biological implant. The cleaning processing device for a biological implant performs cleaning processing of the biological implant by means of radiating ultraviolet rays at the surface of the biological implant and by causing ozone to contact the surface of the biological implant, and the cleaning processing device is characterized by being provided with a housing, an ultraviolet-ray radiating lamp that is disposed within the housing and that radiates ultraviolet rays at the biological implant, an ozone-removing filter disposed within the housing, and a fan that introduces the ambient gas within the housing to the ozone-removing filter, and is further characterized by the fan being driven in response to the end of cleaning processing of the biological implant.

First claim

Opening claim text (preview).

What is claimed is: 1. A cleaning processing device for a biological implant intended to clean the biological implant by radiating ultraviolet rays to a surface of the biological implant and also causing ozone to come into contact with the surface thereof, the device comprising: a housing, the housing including: a processing chamber for cleaning the biological implant, an ozone-removing chamber disposed above the processing chamber, the ozone-removing chamber for removing the o…

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What does patent US9168570B2 cover?
Provided is a cleaning processing device that is for a biological implant and that is capable of quickly eliminating ozone generated by ultraviolet-ray radiation after completion of ultraviolet-ray radiation towards the biological implant. The cleaning processing device for a biological implant performs cleaning processing of the biological implant by means of radiating ultraviolet rays at the …
Who is the assignee on this patent?
Ogawa Yoshimasa, Ushio Electric Inc
What technology area does this patent fall under?
Primary CPC classification B08B7/0057. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Oct 27 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).