Method of a fabricating display substrate and method of fabricating a display device using the same

Patent metadata

Field	Value
Publication number	US-9166203-B2
Application number	US-201414299168-A
Country	US
Kind code	B2
Filing date	Jun 9, 2014
Priority date	Dec 16, 2013
Publication date	Oct 20, 2015
Grant date	Oct 20, 2015

Abstract

A method of fabricating a display substrate includes forming a gate electrode on a substrate, forming a gate insulating layer to cover the gate electrode, forming an active layer on the gate insulating layer, forming a metal layer on the active layer, forming a first mask pattern on the metal layer to face a first region of the active layer, forming a second mask pattern on the metal layer to face a second region and a third region of the active layer, etching the metal layer and the active layer using the first and second mask patterns as an etch mask to form a metal pattern and an active pattern, removing the first mask pattern, and etching the metal pattern using the second mask pattern as an etch mask to form a source electrode and a drain electrode.

First claim

What is claimed is:

1. A method of fabricating a display substrate, comprising:
forming a gate electrode on a substrate;
forming a gate insulating layer to cover the gate electrode;
forming an active layer on the gate insulating layer;
forming a metal layer on the active layer;
forming a first mask pattern on the metal layer to face a first region of the active layer;
forming a second mask pattern on the metal layer to face a second region and a third region of the activ…

Assignees

• Samsung Display Co Ltd

Inventors

• Jeon Woo-Seok

Classifications

• H10P95/00

  Electricity · mapped topic

• H10P76/4085

  Electricity · mapped topic

• H10P50/69

  Electricity · mapped topic

• H10P50/71 Primary

  Electricity · mapped topic

• H10K71/00

  Electricity · mapped topic