Nonvolatile memory device and method for fabricating the same

US9166013B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9166013-B2
Application numberUS-201314020645-A
CountryUS
Kind codeB2
Filing dateSep 6, 2013
Priority dateApr 18, 2013
Publication dateOct 20, 2015
Grant dateOct 20, 2015

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Abstract

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A nonvolatile memory device having a plurality of unit cells, each of the plurality of unit cells includes a first transistor suitable for having a fixed threshold voltage, and a second transistor suitable for coupling to the first transistor in parallel and having a variable threshold voltage.

First claim

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What is claimed is: 1. A nonvolatile memory device, comprising: an isolation trench formed on a substrate and defining an active region; a charge trapping layer formed on a surface of the isolation trench; a gap-fill insulating layer partially filling the isolation trench on the charge trapping layer; a gate formed on the substrate and filling a remaining isolation trench on the gap-fill insulating layer; and a source and a drain formed on the active region under both side…

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What does patent US9166013B2 cover?
A nonvolatile memory device having a plurality of unit cells, each of the plurality of unit cells includes a first transistor suitable for having a fixed threshold voltage, and a second transistor suitable for coupling to the first transistor in parallel and having a variable threshold voltage.
Who is the assignee on this patent?
Sk Hynix Inc
What technology area does this patent fall under?
Primary CPC classification H10D30/691. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Oct 20 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).