Adjustable slot antenna for control of uniformity in a surface wave plasma source

Patent metadata

Field	Value
Publication number	US-9155183-B2
Application number	US-201313750392-A
Country	US
Kind code	B2
Filing date	Jan 25, 2013
Priority date	Jul 24, 2012
Publication date	Oct 6, 2015
Grant date	Oct 6, 2015

Abstract

The present invention provides a surface wave plasma source including an electromagnetic (EM) wave launcher comprising a slot antenna having a plurality of antenna slots configured to couple the EM energy from a first region above the slot antenna to a second region below the slot antenna, and a power coupling system is coupled to the EM wave launcher. A dielectric window is positioned in the second region and has a lower surface including the plasma surface. A slotted gate plate is arranged parallel with the slot antenna and is configured to be movable relative to the slot antenna between variable opacity positions including a first opaque position to prevent the EM energy from passing through the first arrangements of antenna slots, and a first transparent position to allow a full intensity of the EM energy to pass through the first arrangement of antenna slots.

First claim

What is claimed is:

1. A surface wave plasma source (SWPS), comprising:
an electromagnetic (EM) wave launcher configured to couple EM energy in a desired EM wave mode to a plasma by generating a surface wave on a plasma surface located adjacent said plasma, said EM wave launcher comprising a slot antenna having a plurality of antenna slots formed therethrough configured to couple said EM energy from a first region above said slot antenna to a second region below said slot antenna;
a dielectric window positioned in said second region and having a lower surface of said dielectric window including said plasma surface;
a slotted gate plate arranged parallel with said slot antenna and configured to be movable relative to said slot antenna between variable opacity positions including a first opaque position in which at least one first gate slot is misaligned with a first arrangement of antenna slots in said plurality of antenna slots to prevent said EM energy from passing through said first arrangements of antenna slots, and a first transparent position in which said at least one first gate slot is aligned with said first arrangement of antenna slots to allow a full intensity of said EM energy to pass through said first arrangement of antenna slots; and
a power coupling system coupled to said EM wave launcher and configured to provide said EM energy to said EM wave launcher for forming said plasma.

2. The surface wave plasma source of claim 1 , wherein said slotted gate plate is linearly translatable relative to said slot antenna.

3. The surface wave plasma source of claim 1 , wherein said slotted gate plate is rotatable relative to said slot antenna.

4. The surface wave plasma source of claim 1 , wherein said variable opacity positions include one or more first intermediate opacity positions between said first opaque position and said first transparent position in which said at least one first gate slot is partially aligned with said first arrangement of antenna slots to allow a fraction of said EM energy to pass through said first arrangement of antenna slots.

5. The surface wave plasma source of claim 4 , further comprising a drive mechanism operably coupled to said slotted gate plate and configured to support and adjustably move said slotted gate plate with respect to said slot antenna.

6. The surface wave plasma source of claim 5 , further comprising a controller coupled to said drive mechanism and configured to direct said drive mechanism to move said slotted gate plate to a selected variable opacity position.

7. The surface wave plasma source of claim 6 , wherein said controller is configured to determine said selected variable opacity position from a supplied opacity value.

8. The surface wave plasma source of claim 1 , wherein said slotted gate plate is located between said dielectric window and said slot antenna.

9. The surface wave plasma source of claim 1 including at least a second gate slot in said slotted gate plate and further including a second arrangement of antenna slots in said plurality of antenna slots, wherein said variable opacity positions include a second opaque position in which said at least one second gate slot is misaligned with said second arrangement of antenna slots to prevent said EM energy from passing through said second arrangement of antenna slots, and a second transparent position in which said at least one second gate slot is aligned with said second arrangement of antenna slots to allow said full intensity of said EM energy to pass through said second arrangement of antenna slots.

10. The surface wave plasma source of claim 9 , wherein said variable opacity positions include one or more second intermediate opacity positions between said second opaque position and said second transparent position in which said at least one second gate slot is partially aligned with said second arrangement of antenna slots to allow a fraction of said EM energy to pass through said second arrangement of antenna slots.

11. The surface wave plasma source of claim 1 further comprising a second slotted gate plate disposed coaxial and coplanar to said slotted gate plate that includes at least one second gate slot arranged parallel to a second arrangement of antenna slots in said plurality of antenna slots, wherein said variable opacity positions include a second opaque position in which said at least one second gate slot is misaligned with said second arrangement of antenna slots to prevent said EM energy from passing through said second arrangement of antenna slots, and a second transparent position in which said at least one second gate slot is aligned with said second arrangement of antenna slots to allow said full intensity of said EM energy to pass through said second arrangement of antenna slots.

12. The surface wave plasma source of claim 11 , wherein said second slotted gate plate is moveable independently of said slotted gate plate.

13. A method for controlling plasma properties in a surface wave plasma source (SWPS) having an electromagnetic (EM) wave launcher configured to couple EM energy in a desired EM wave mode to a plasma by generating a surface wave on a plasma surface located adjacent said plasma, said EM wave launcher comprising a slot antenna having a plurality of antenna slots formed therethrough configured to couple said EM energy from a first region above said slot antenna to a second region below said slot antenna; a dielectric window positioned in said second region having a lower surface including said plasma surface; and a power coupling system coupled to said EM wave launcher and configured to provide said EM energy to said EM wave launcher for forming said plasma, the method comprising:
controlling a plasma property by changing an orientation of a slotted gate plate with respect to said slot antenna, wherein said slotted gate plate is parallel with said slot antenna and configured to be movable relative to said slot antenna between variable opacity positions including a first opaque position in which at least one first gate slot is misaligned with a first arrangement of antenna slots in said plurality of antenna slots to prevent said EM energy from passing through said first arrangements of antenna slots, and a first transparent position in which said at least one first gate slot is aligned with said first arrangement of antenna slots to allow a full intensity of said EM energy to pass through said first arrangement of antenna slots.

14. The method of claim 13 , wherein changing said orientation of said slotted gate plate with respect to said slot antenna includes moving said slotted gate plate to said first opaque position.

15. The method of claim 13 , wherein changing said orientation of said slotted gate plate with respect to said slot antenna includes moving said slotted gate plate to said first transparent position.

16. The method of claim 13 , wherein changing said orientation of said slotted gate plate with respect to said slot antenna includes moving said slotted gate plate to an intermediate opacity position between said first opaque position and said first transparent position.

17. The method of claim 16 , wherein said position between said first opaque position and said first transparent position is varied as a function of time during operation of said SWPS.

18. The method of claim 13 , further comprising:
using a drive mechanism operably connected to said slotted gate plate, to move said slotted gate plate with respect to said slot antenna.

19. The method of claim 13 , in an SWPS further including

Assignees

• Tokyo Electron Ltd

Inventors

• Voronin Sergey A
• Ranjan Alok

Classifications

• H05H1/46 Primary

  using applied electromagnetic fields, e.g. high frequency or microwave energy (H05H1/26 takes precedence) · CPC title

• H05H2001/463

  Electricity · mapped topic

• H05H2001/4615

  Electricity · mapped topic

• H05H1/463

  using antennas or applicators · CPC title

• H05H1/4615

  using surface waves · CPC title