Polishing composition, polishing method using same, and method for producing semiconductor device

US9150758B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9150758-B2
Application numberUS-201214007272-A
CountryUS
Kind codeB2
Filing dateMar 28, 2012
Priority dateMar 30, 2011
Publication dateOct 6, 2015
Grant dateOct 6, 2015

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

Official abstract text for this publication.

The polishing composition of the present invention contains an oxidizing agent and a scratch-reducing agent represented by general formula (1) or (2) below. In the formulas, X 1 and X 2 are each independently a hydrogen atom, a hydroxyl group, a carboxyl group, a phosphate group, an alkyl group, an aryl group, an alkyl polyamine group, an alkyl polyphosphate group, an alkyl polycarboxylate group, an alkyl polyaminopolyphosphate group, or an alkyl polyaminopolycarboxylate group.

First claim

Opening claim text (preview).

The invention claimed is: 1. A polishing composition used in polishing a surface of an object to be polished that includes a first portion comprised of copper or a copper alloy and a second portion comprised of tantalum, tantalum nitride, a tantalum alloy, titanium, titanium nitride, a titanium alloy, tungsten, tungsten nitride, or a tungsten alloy, the composition comprising an oxidizing agent and a scratch-reducing agent represented by general formula (1) or (2) below,…

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What does patent US9150758B2 cover?
The polishing composition of the present invention contains an oxidizing agent and a scratch-reducing agent represented by general formula (1) or (2) below. In the formulas, X 1 and X 2 are each independently a hydrogen atom, a hydroxyl group, a carboxyl group, a phosphate group, an alkyl group, an aryl group, an alkyl polyamine group, an alkyl polyphosphate group, …
Who is the assignee on this patent?
Miller Anne, Saito Chiaki, Fukuda Kanako, and 1 more
What technology area does this patent fall under?
Primary CPC classification H10P52/00. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Oct 06 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).