BSI image sensor and method of forming same
US-11916091-B2 · Feb 27, 2024 · US
US9147702B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9147702-B2 |
| Application number | US-201313769421-A |
| Country | US |
| Kind code | B2 |
| Filing date | Feb 18, 2013 |
| Priority date | Feb 18, 2013 |
| Publication date | Sep 29, 2015 |
| Grant date | Sep 29, 2015 |
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One or more embodiments of techniques or systems for mitigating dark current of an image sensor are provided herein. Generally, a silicon interface, such as an edge of a dielectric region or an edge between a back side interface (BSI) region and a pass region, is a source of electrons or holes which cause dark current. In some embodiments, the image sensor includes a surface protect region. For example, the surface protect region is doped with a first doping type and a photo-diode of the image sensor is doped with the same first doping type. In this manner, the surface protect region acts as an electron magnet or a hole magnet for electrons or holes from the silicon interface, thus mitigating electrons or holes from the silicon interface from being collected by the photo-diode, for example.
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What is claimed is: 1. An image sensor for mitigating dark current, comprising: a first region comprising a first doping type; a second region comprising a second doping type, the second doping type opposite of the first doping type, the first region surrounded by the second region; a first surface protect region above the second region and comprising the first doping type; a first silicon interface comprising an edge between the first surface protect region and a dielectric…
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
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