Extreme ultraviolet light generation apparatus and control method for laser apparatus in extreme ultraviolet light generation system

Patent metadata

Field	Value
Publication number	US-9131589-B2
Application number	US-201414290483-A
Country	US
Kind code	B2
Filing date	May 29, 2014
Priority date	May 31, 2013
Publication date	Sep 8, 2015
Grant date	Sep 8, 2015

Abstract

An extreme ultraviolet light generation apparatus may include a chamber containing a plasma generation region irradiated by a pulse laser beam from a laser apparatus, a target supply device configured to supply a plurality of targets consecutively to the plasma generation region in the chamber, a target detection unit configured to detect a target outputted from the target supply device, and a laser controller configured to control the laser apparatus; the laser controller generating a light emission trigger instructing a laser device included in the laser apparatus to emit a pulse laser beam, and outputting the generated light emission trigger to the laser apparatus, in accordance with a detection signal from the target detection unit; and the laser controller adjusting generation of the light emission trigger outputted consecutively to the laser apparatus so that a time interval of the light emission trigger is within a predetermined range.

First claim

What is claimed is:

1. An extreme ultraviolet light generation apparatus that generates extreme ultraviolet light by irradiating a target with a pulse laser beam and producing plasma, the apparatus comprising:
a chamber containing a plasma generation region irradiated by a pulse laser beam from a laser apparatus;
a target supply device configured to supply a plurality of targets consecutively to the plasma generation region in the chamber;
a target detection unit configured to detect a target outputted from the target supply device that has passed a predetermined position between the target supply device and the plasma generation region; and
laser control circuitry configured to control the laser apparatus, wherein:
the laser control circuitry includes a light emission trigger generation circuit configured to generate a light emission trigger instructing a laser device included in the laser apparatus to emit a pulse laser beam, and output the generated light emission trigger to the laser apparatus,
the light emission trigger generation circuit is configured to generate a dummy light emission trigger and output the generated dummy light emission trigger to the laser apparatus after a detection signal has been received from the target detection unit and a second time has passed following the reception of the detection signal without a subsequent detection signal being received,
the laser apparatus further includes an optical shutter that controls transmission of the pulse laser beam from the laser device,
the laser control circuitry is further configured to control the optical shutter to block the pulse laser beam emitted from the laser device in accordance with the dummy light emission trigger,
the laser device is a main pulse laser device,
the laser apparatus further includes a pre-pulse laser device that emits a pre-pulse laser beam before the pulse laser beam is emitted from the main pulse laser device and a second optical shutter that controls transmission of the pre-pulse laser beam, and
the laser control circuitry further configured to:
output a light emission trigger to the main pulse laser device after outputting a light emission trigger to the pre-pulse laser device upon receiving the detection signal from the target detection unit indicating that a target has been detected;
output a second dummy light emission trigger to the main pulse laser device after outputting a first dummy light emission trigger to the pre-pulse laser device when the second time has passed following the reception of the previous detection signal from the target detection unit;
control the second optical shutter to block the pre-pulse laser beam emitted from the pre-pulse laser device in accordance with the first dummy light emission trigger; and
control the optical shutter to block the pulse laser beam emitted from the main pulse laser device in accordance with the second dummy light emission trigger.

2. The extreme ultraviolet light generation apparatus according to claim 1 , wherein the light emission trigger generation circuit includes:
a dummy detection signal generation circuit configured to output a dummy detection signal after the second time has passed from a detection signal received from the target detection unit;
an OR circuit configured to output an OR signal of the detection signal from the target detection unit and the dummy detection signal;
a first circuit configured to output a first signal that changes from OFF to ON after a first time has passed from the OR signal; and
an AND circuit configured to output an AND signal of the first signal and the OR signal from the OR circuit.

3. An extreme ultraviolet light generation apparatus that generates extreme ultraviolet light by irradiating a target with a pulse laser beam and producing plasma, the apparatus comprising:
a chamber containing a plasma generation region irradiated by a pulse laser beam from a laser apparatus;
a target supply device configured to supply a plurality of targets consecutively to the plasma generation region in the chamber;
a target detection unit configured to detect a target outputted from the target supply device that has passed a predetermined position between the target supply device and the plasma generation region; and
laser control circuitry configured to control the laser apparatus, wherein:
the laser control circuitry includes a light emission trigger generation circuit configured to generate a light emission trigger instructing a laser device included in the laser apparatus to emit a pulse laser beam, and output the generated light emission trigger to the laser apparatus,
the light emission trigger generation circuit is configured to generate a dummy light emission trigger and output the generated dummy light emission trigger to the laser apparatus after a detection signal has been received from the target detection unit and a second time has passed following the reception of the detection signal without a subsequent detection signal being received, and
the light emission trigger generation circuit includes:
a dummy detection signal generation circuit configured to output a dummy detection signal after the second time has passed from a detection signal received from the target detection unit;
an OR circuit configured to output an OR signal of the detection signal from the target detection unit and the dummy detection signal;
a first circuit configured to output a first signal that changes from OFF to ON after a first time has passed from the OR signal; and
an AND circuit configured to output an AND signal of the first signal and the OR signal from the OR circuit.

4. The extreme ultraviolet light generation apparatus according to claim 3 , wherein:
the laser apparatus further includes an optical shutter that controls transmission of the pulse laser beam from the laser device, and
the laser control circuitry is further configured to control the optical shutter to block the pulse laser beam emitted from the laser device in accordance with the dummy light emission trigger.

Assignees

• Gigaphoton Inc

Inventors

• Hayashi Hideyuki
• Suzuki Kazuhiro
• Wakabayashi Osamu

Classifications

• H05G2/0084 Primary

  Control of the laser beam · CPC title

• H01S3/005

  Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping (shaping laser beam for working metal or other materials B23K26/06; optical elements, systems or apparatus in general G02B) · CPC title

• H01S3/2316

  Cascaded amplifiers · CPC title

• H01S3/10038

  Amplitude control · CPC title

• H01S3/10015

  by monitoring or controlling, e.g. attenuating, the input signal · CPC title