Target supply device and EUV light generation chamber

Patent metadata

Field	Value
Publication number	US-9125285-B2
Application number	US-201414159909-A
Country	US
Kind code	B2
Filing date	Jan 21, 2014
Priority date	Jan 25, 2013
Publication date	Sep 1, 2015
Grant date	Sep 1, 2015

Abstract

A target supply device may include a tank including a nozzle, a first electrode disposed within the tank, a first potential setting unit configured to set a potential at the first electrode to a first potential, a second electrode provided with a first through-hole and disposed so that a center axis of the nozzle is positioned within the first through-hole, a second potential setting unit configured to set a potential at the second electrode to a second potential that is different from the first potential, and a charge neutralization unit configured to neutralize a charge of the target material that passes through a first region located between the second electrode and the plasma generation region.

First claim

What is claimed is:

1. A target supply device that supplies a droplet of a target material to a plasma generation region, the device comprising:
a target generator comprising:
a tank containing the target material;
a nozzle from which the droplet is supplied toward the plasma generation region;
a first electrode disposed within the tank;
a second electrode provided with a first through-hole and disposed so that a center axis of the nozzle is positioned within the first thro…

Assignees

• Gigaphoton Inc

Inventors

• Umeda Hiroshi

Classifications

• H05G2/0027

  Electricity · mapped topic

• H05G2/0023 Primary

  Electricity · mapped topic

• H05G2/006

  Electricity · mapped topic

• H05G2/008 Primary

  Electricity · mapped topic

• H05G2/005

  Electricity · mapped topic