Manufacturing method of display substrate, display substrate and display device
US-12062711-B2 · Aug 13, 2024 · US
US9111815B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9111815-B2 |
| Application number | US-201213478541-A |
| Country | US |
| Kind code | B2 |
| Filing date | May 23, 2012 |
| Priority date | May 30, 2011 |
| Publication date | Aug 18, 2015 |
| Grant date | Aug 18, 2015 |
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An embodiment of the disclosed technology provides a pixel structure, comprising a TFT, a reflective region and a transmissive region, wherein the reflective region comprises a reflective region insulation layer, a reflection layer on the reflective region insulation layer and a reflective region pixel electrode on the reflection layer, and the transmissive region comprises a transmissive region pixel electrode, wherein the reflective region pixel electrode and the transmissive region pixel electrode form an integral structure, and the integral structure of the pixel electrodes is connected with the drain electrode of the TFT, wherein the organic layer in the reflective region is formed on an array substrate prior to a gate electrode of the TFT, and the reflection layer in the reflective region and the gate electrode of the TFT are formed in a same patterning process by using a same metal layer.
Opening claim text (preview).
What is claimed is: 1. A pixel structure, comprising a thin film transistor (TFT), a reflective region and a transmissive region, wherein the reflective region comprises a reflective region insulation layer, a reflection layer on the reflective region insulation layer and a reflective region pixel electrode on the reflection layer, and the transmissive region comprises a transmissive region pixel electrode, wherein the reflective region pixel electrode and the transmissive reg…
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