Systems and methods for high-throughput and small-footprint scanning exposure for lithography
US-9519225-B2 · Dec 13, 2016 · US
Exposure device for the structured exposure of a surface
US9110380B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9110380-B2 |
| Application number | US-201213820399-A |
| Country | US |
| Kind code | B2 |
| Filing date | Mar 8, 2012 |
| Priority date | Apr 4, 2011 |
| Publication date | Aug 18, 2015 |
| Grant date | Aug 18, 2015 |
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Abstract
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The invention relates to an exposure device ( 14 ) for the structured exposure of a wafer, having at least one exposure arrangement with which a beam that is separated into two sub-beams is modulated via two micromirror arrays in order to increase the throughput speed during the exposure of wafers.
First claim
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What is claimed is: 1. An exposure device for the structured exposure of a wafer, comprising at least one exposure arrangement, in which, one after another along an optical axis, a planar emitter, which emits a ray bundle, optical elements for imaging the ray bundle onto a downstream micromirror array for structuring the ray bundle, a first optically imaging system, a microlens array corresponding to the micromirror array, and a second optically imaging system for imaging the struc…
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Electricity · mapped topic
Physics · mapped topic
Physics · mapped topic
Physics · mapped topic
Physics · mapped topic
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Frequently asked questions
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- What does patent US9110380B2 cover?
- The invention relates to an exposure device ( 14 ) for the structured exposure of a wafer, having at least one exposure arrangement with which a beam that is separated into two sub-beams is modulated via two micromirror arrays in order to increase the throughput speed during the exposure of wafers.
- Who is the assignee on this patent?
- Werschnik Jan, Augustin Markus, Reichmann Lutz, and 1 more
- What technology area does this patent fall under?
- Primary CPC classification G03F7/70208. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Aug 18 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).