Substrate correction device, substrate lamination device, substrate processing system, substrate correction method, substrate processing method, and semiconductor device manufacturing method
US-2024404859-A1 · Dec 5, 2024 · US
US9105675B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9105675-B2 |
| Application number | US-201313874777-A |
| Country | US |
| Kind code | B2 |
| Filing date | May 1, 2013 |
| Priority date | Jan 7, 2004 |
| Publication date | Aug 11, 2015 |
| Grant date | Aug 11, 2015 |
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
What the patent document calls the invention.
A short plain-language summary of the technical disclosure.
Who owns or filed the patent and who is credited as inventor.
Filing, priority, publication, and grant dates set the timeline.
The legal scope of protection — read this for what is actually claimed.
Technology tags used to group this patent with similar filings.
Prior art links and similar publications in this corpus.
Official abstract text for this publication.
A stacking apparatus that stacks chip assemblies each having a plurality of chips disposed continuously with circuit patterns and electrodes, includes: a plurality of stages each allowed to move arbitrarily, on which the chip assemblies are placed; a storage unit that stores an estimated extent of change in a position of an electrode at each chip, expected to occur as heat is applied to the chip assemblies placed on the plurality of stages during a stacking process; and a control unit that sets positions of the plurality of stages to be assumed relative to each other during the stacking process based upon the estimated extent of change in the position of the electrode at each chip provided from the storage unit and position information indicating positions of individual chips formed at the chip assemblies and controls at least one of the plurality of stages.
Opening claim text (preview).
What is claimed is: 1. An apparatus comprising: a transfer member configured to transfer a plurality of wafers including a first wafer and a second wafer, the first wafer including a first specific area and the second wafer including a second specific area, while the plurality of wafers are held together in alignment such that the first specific area remains aligned with the second specific area, wherein the alignment of the first specific area and the second specific area allow…
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
Cross-Sectional Technologies · mapped topic
Related publications grouped by family.
Free tools are coming soon. Tell us what you want to track and we'll notify you.
Answers are generated from the same data shown on this page.