Exposure apparatus, exposure method, and manufacturing method of device
US-2016266500-A1 · Sep 15, 2016 · US
Method for controlling exposure apparatus and exposure apparatus
US9104115B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9104115-B2 |
| Application number | US-201313778645-A |
| Country | US |
| Kind code | B2 |
| Filing date | Feb 27, 2013 |
| Priority date | Aug 28, 2012 |
| Publication date | Aug 11, 2015 |
| Grant date | Aug 11, 2015 |
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Abstract
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According to one embodiment, a method for controlling an exposure apparatus includes calculating a shift from a target value of an illuminance distribution on a reticle of light irradiated onto the reticle. The calculating is based on a relational expression and a measured value of an illuminance distribution on a wafer of light irradiated onto the wafer via a projection optical system. The relational expression has a correlation between the illuminance distribution on the reticle, the illuminance distribution on the wafer, and a spread function reflecting a characteristic of the projection optical system projecting light obtained by way of the reticle onto the wafer.
First claim
Opening claim text (preview).
What is claimed is: 1. A method for controlling an exposure slit of an exposure apparatus, comprising: calculating a shift from a target value of an illuminance distribution on a reticle of light irradiated onto the reticle, the calculating being based on a relational expression and a measured value of an illuminance distribution on a wafer of light irradiated onto the wafer via a projection optical system, the relational expression having a correlation between the illuminance dis…
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Physics · mapped topic
- G03F7/70133Primary
Physics · mapped topic
Physics · mapped topic
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- What does patent US9104115B2 cover?
- According to one embodiment, a method for controlling an exposure apparatus includes calculating a shift from a target value of an illuminance distribution on a reticle of light irradiated onto the reticle. The calculating is based on a relational expression and a measured value of an illuminance distribution on a wafer of light irradiated onto the wafer via a projection optical system. The rel…
- Who is the assignee on this patent?
- Toshiba Kk
- What technology area does this patent fall under?
- Primary CPC classification G03F7/70133. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Aug 11 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).