Chemically amplified positive resist composition and resist pattern forming process
US-12164231-B2 · Dec 10, 2024 · US
US9068024B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9068024-B2 |
| Application number | US-201213983106-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jan 30, 2012 |
| Priority date | Feb 2, 2011 |
| Publication date | Jun 30, 2015 |
| Grant date | Jun 30, 2015 |
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
What the patent document calls the invention.
A short plain-language summary of the technical disclosure.
Who owns or filed the patent and who is credited as inventor.
Filing, priority, publication, and grant dates set the timeline.
The legal scope of protection — read this for what is actually claimed.
Technology tags used to group this patent with similar filings.
Prior art links and similar publications in this corpus.
Official abstract text for this publication.
The invention provides 2,2-dimethoxy-1,2-di-[4-(meth)acryloyloxy]phenylethane-1-one represented by the following formula (A): (wherein R 1 and R 2 , which may be identical to or different from each other, each represent a hydrogen atom or a methyl group).
Opening claim text (preview).
The invention claimed is: 1. 2,2-Dimethoxy-1,2-di-[4-(meth)acryloyloxy]phenylethan-1-one represented by the following formula (A): (wherein R 1 and R 2 , which may be identical to or different from each other, each represent a hydrogen atom or a methyl group). 2. A radical polymerization initiator, characterized by being 2,2-dimethoxy-1,2-di-[4-(met…
Related publications grouped by family.
Free tools are coming soon. Tell us what you want to track and we'll notify you.
Answers are generated from the same data shown on this page.