Semiconductor device and method of forming a vertical interconnect structure for 3-D FO-WLCSP

US9064936B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9064936-B2
Application numberUS-201313832333-A
CountryUS
Kind codeB2
Filing dateMar 15, 2013
Priority dateDec 12, 2008
Publication dateJun 23, 2015
Grant dateJun 23, 2015

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A semiconductor device has an encapsulant deposited over a first surface of the semiconductor die and around the semiconductor die. A first insulating layer is formed over a second surface of the semiconductor die opposite the first surface. A conductive layer is formed over the first insulating layer. An interconnect structure is formed through the encapsulant outside a footprint of the semiconductor die and electrically connected to the conductive layer. The first insulating layer includes an optically transparent or translucent material. The semiconductor die includes a sensor configured to receive an external stimulus passing through the first insulating layer. A second insulating layer is formed over the first surface of the semiconductor die. A conductive via is formed through the first insulating layer outside a footprint of the semiconductor die. A plurality of stacked semiconductor devices is electrically connected through the interconnect structure.

First claim

Opening claim text (preview).

What is claimed: 1. A semiconductor device, comprising: a semiconductor die; a conductive layer formed over the semiconductor die; an encapsulant deposited around the semiconductor die; a first insulating layer formed over a surface of the semiconductor die opposite the conductive layer; and an interconnect structure formed through the encapsulant and first insulating layer outside a footprint of the semiconductor die. 2. The semiconductor device of claim 1 , further including a second insulating layer formed over the semiconductor die, wherein the second insulating layer includes an optically transparent or translucent material. 3. The semiconductor device of claim 1 , wherein the interconnect structure further includes: an opening formed through the encapsulant over the conductive layer; and a conductive material deposited in the opening electrically connected to the conductive layer. 4. The semiconductor device of claim 1 , further including a conductive via formed through the first insulating layer outside the footprint of the semiconductor die. 5. The semiconductor device of claim 1 , further including a plurality of stacked semiconductor devices electrically connected through the interconnect structure. 6. A semiconductor device, comprising: a semiconductor die; a conductive layer formed over the semiconductor die; a first insulating layer formed over the semiconductor die; and an interconnect structure formed outside a footprint of the semiconductor die through the first insulating layer and electrically connected to the conductive layer. 7. The semiconductor device of claim 6 , further including an encapsulant deposited over and around the semiconductor die and the interconnect structure. 8. The semiconductor device of claim 6 , further including a second insulating layer formed over the conductive layer. 9. The semiconductor device of claim 6 , wherein the interconnect structure includes a printed circuit board. 10. The semiconductor device of claim 8 , wherein the second insulating layer includes an optically transparent or translucent material. 11. The semiconductor device of claim 8 , wherein the semiconductor die further includes a sensor configured to receive an external stimulus passing through the second insulating layer. 12. The semiconductor device of claim 6 , further including a plurality of stacked semiconductor devices electrically connected through the interconnect structure.

Assignees

Inventors

Classifications

  • the stacked chips having different sizes, e.g. chip stacks having a pyramidal shape · CPC title

  • the arrangements being on an external surface of the package, e.g. on the outer surface of an encapsulation · CPC title

  • Encapsulations, e.g. protective coatings · CPC title

  • characterised by their shape or disposition · CPC title

  • the encapsulations exposing the passive side of the semiconductor body · CPC title

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Frequently asked questions

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What does patent US9064936B2 cover?
A semiconductor device has an encapsulant deposited over a first surface of the semiconductor die and around the semiconductor die. A first insulating layer is formed over a second surface of the semiconductor die opposite the first surface. A conductive layer is formed over the first insulating layer. An interconnect structure is formed through the encapsulant outside a footprint of the semico…
Who is the assignee on this patent?
Stats Chippac Ltd
What technology area does this patent fall under?
Primary CPC classification H10W90/00. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Jun 23 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).