System and methods for controlling an amount of primer in a primer application gas
US-2024379467-A1 · Nov 14, 2024 · US
Dielectric doping using high productivity combinatorial methods
US9040465B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9040465-B2 |
| Application number | US-201213680701-A |
| Country | US |
| Kind code | B2 |
| Filing date | Nov 19, 2012 |
| Priority date | Nov 19, 2012 |
| Publication date | May 26, 2015 |
| Grant date | May 26, 2015 |
How to read this patent
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
- Title
What the patent document calls the invention.
- Abstract
A short plain-language summary of the technical disclosure.
- Assignees and inventors
Who owns or filed the patent and who is credited as inventor.
- Key dates
Filing, priority, publication, and grant dates set the timeline.
- First independent claim
The legal scope of protection — read this for what is actually claimed.
- CPC / IPC classifications
Technology tags used to group this patent with similar filings.
- Citations and related patents
Prior art links and similar publications in this corpus.
Abstract
Official abstract text for this publication.
A combination of deposition processes can be used to evaluate layer properties using a combinatorial workflow. The processes can include a base ALD process and another process, such as a PVD process. The high productivity combinatorial technique can provide an evaluation of the material properties for given ALD base layer and PVD additional elements. An ALD process can then be developed to provide the desired layers, replacing the ALD and PVD combination.
First claim
Opening claim text (preview).
What is claimed is: 1. A method for evaluating material composition in a combinatorial manner, the method comprising providing a substrate, wherein the substrate has a plurality of site isolated regions defined thereon, and wherein the substrate is one of a silicon-containing substrate, a germanium-containing substrate, a III-V substrate, or a II-VI substrate; depositing a plurality of test layer stacks comprising: depositing a first layer on the substrate using a first atomic…
Assignees
Inventors
Classifications
Patent family
Related publications grouped by family.
External sources
Next steps
Free tools are coming soon. Tell us what you want to track and we'll notify you.
Frequently asked questions
Answers are generated from the same data shown on this page.
- What does patent US9040465B2 cover?
- A combination of deposition processes can be used to evaluate layer properties using a combinatorial workflow. The processes can include a base ALD process and another process, such as a PVD process. The high productivity combinatorial technique can provide an evaluation of the material properties for given ALD base layer and PVD additional elements. An ALD process can then be developed to prov…
- Who is the assignee on this patent?
- Intermolecular Inc, Intermolecular Inc
- What technology area does this patent fall under?
- Primary CPC classification H10P74/23. Mapped technology areas include Electricity.
- When was this patent published?
- Publication date Tue May 26 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).