Method of polishing object to be polished

US9033764B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9033764-B2
Application numberUS-201113225961-A
CountryUS
Kind codeB2
Filing dateSep 6, 2011
Priority dateSep 9, 2010
Publication dateMay 19, 2015
Grant dateMay 19, 2015

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The present invention provides: a method of polishing an object to be polished for processing a surface of the object to be polished into a concave or convex state with a high degree of accuracy; and a polishing pad. An object to be polished is placed on a polishing pad over the boundary between the first polishing region and the second polishing region, the first polishing region has grooves and the second polishing region has grooves different from those of the first polishing region, and either one of the two regions being formed on a region on the center side, and the other on the outer side in a radial direction on the surface of the polishing pad; and the object to be polished is polished by rotating the polishing pad and the object to be polished.

First claim

Opening claim text (preview).

What is claimed is: 1. A method of polishing an object to be polished, wherein a surface of the object to be polished is processed into a concave or convex state by: placing the object to be polished on a polishing pad over a boundary between a first polishing region and a second polishing region, the polishing pad having a first polishing region where grooves are formed and a second polishing region where grooves are formed in a different state from that of the first polishing re…

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What does patent US9033764B2 cover?
The present invention provides: a method of polishing an object to be polished for processing a surface of the object to be polished into a concave or convex state with a high degree of accuracy; and a polishing pad. An object to be polished is placed on a polishing pad over the boundary between the first polishing region and the second polishing region, the first polishing region has grooves a…
Who is the assignee on this patent?
Kitamura Kazumasa, Nagae Tomoki, Ngk Insulators Ltd
What technology area does this patent fall under?
Primary CPC classification H10P52/00. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue May 19 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).