Photoresist stripping and cleaning composition, method of its preparation and its use
US-9223221-B2 · Dec 29, 2015 · US
Methods for forming a channel through a polymer layer using one or more photoresist layers
US9028772B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9028772-B2 |
| Application number | US-201313931086-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jun 28, 2013 |
| Priority date | Jun 28, 2013 |
| Publication date | May 12, 2015 |
| Grant date | May 12, 2015 |
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Abstract
Official abstract text for this publication.
A method may involve forming one or more photoresist layers over a sensor located on a structure, such that the sensor is covered by the one or more photoresist layers. The sensor is configured to detect an analyte. The method may involve forming a first polymer layer. Further, the method may involve positioning the structure on the first polymer layer. Still further, the method may involve forming a second polymer layer over the first polymer layer and the structure, such that the structure is fully enclosed by the first polymer layer, the second polymer layer, and the one or more photoresist layers. The method may also involve removing the one or more photoresist layers to form a channel through the second polymer layer, wherein the sensor is configured to receive the analyte via the channel.
First claim
Opening claim text (preview).
The invention claimed is: 1. A method comprising: forming one or more photoresist layers over a sensor located on a structure, such that the sensor is covered by the one or more photoresist layers, wherein the sensor is configured to detect an analyte; forming a first polymer layer, wherein the first polymer layer defines a posterior side of an eye-mountable device; positioning the structure on the first polymer layer; forming a second polymer layer over the first polymer la…
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Frequently asked questions
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- What does patent US9028772B2 cover?
- A method may involve forming one or more photoresist layers over a sensor located on a structure, such that the sensor is covered by the one or more photoresist layers. The sensor is configured to detect an analyte. The method may involve forming a first polymer layer. Further, the method may involve positioning the structure on the first polymer layer. Still further, the method may involve for…
- Who is the assignee on this patent?
- Google Inc
- What technology area does this patent fall under?
- Primary CPC classification G03F7/425. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue May 12 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).